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On the Mechanism of Hydrogen Diffusion in Si Solar Cells Using PECVD SiN:H
Published online by Cambridge University Press: 17 March 2011
Abstract
A mechanism for transport and diffusion of H in a silicon solar cell by PECVD SiN:H process is proposed. Plasma-induced surface damage “stores” H during the nitride deposition, which is driven into the bulk of the solar cell during metal-contact firing. Theoretical and experimental results are given that verify this mechanism.
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- Copyright © Materials Research Society 2004
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