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Nucleation And Growth of Yttria-Stabilized Zirconia Thin Films Using Combustion Chemical Vapor Deposition

Published online by Cambridge University Press:  11 February 2011

Zhigang Xu
Affiliation:
NSF Center for Advanced materials and Smart Structures, North Carolina A&T State University, Greensboro, NC 27411
Jag Sankar
Affiliation:
NSF Center for Advanced materials and Smart Structures, North Carolina A&T State University, Greensboro, NC 27411
Sergey Yarmolenko
Affiliation:
NSF Center for Advanced materials and Smart Structures, North Carolina A&T State University, Greensboro, NC 27411
Qiuming Wei
Affiliation:
NSF Center for Advanced materials and Smart Structures, North Carolina A&T State University, Greensboro, NC 27411 Department of Mechanical Engineering, The Johns Hopkins University, Baltimore, MD 21218
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Abstract

Liquid fuel combustion chemical vapor deposition technique was successfully used for YSZ thin film processing. The nucleation rates were obtained for the samples processed at different temperatures and total-metal-concentrations in the liquid fuel. An optimum substrate temperature was found for the highest nucleation rate. The nucleation rate was increased with the total-metal-concentration. Structural evolution of the thin film in the early processing stage was studied with regard to the formation of nuclei, crystallites and final crystals on the films. The films were found to be affected by high temperature annealing. The crystals and the thin films were characterized with scanning electron microscopy.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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Nucleation And Growth of Yttria-Stabilized Zirconia Thin Films Using Combustion Chemical Vapor Deposition
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