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New method of photochemical adhesion of fused silica glasses by using Xe2 excimer lamp

Published online by Cambridge University Press:  01 February 2011

Takayuki Funatsu
Affiliation:
takfun18laser@yahoo.co.jp, Tokyo Institute of Technology, Mechanical Sciences and Engineering, 2-12-1 O-okayama, Meguro-ku Tokyo, 152-8550, JAPAN, Tokyo, N/A, Japan
Yuji Sato
Affiliation:
sato.y.ak@m.titech.ac.jp, Tokyo Institute of Technology, Entropia Laser Initiative, 2-12-1 O-okayama, Meguro-ku, Tokyo, 152-8552, Japan
Yoshiaki Okamoto
Affiliation:
info@okamoto-optics.co.jp, Okamoto Optic Co,, 8-34 Haramachi, Isogo-ku, Yokohama,, Kanagawa, 235-0008, Japan
Masataka Murahara
Affiliation:
murahara@vesta.ocn.ne.jp, Tokyo Institute of Technology, Entropia Laser Initiative, 2-12-1 O-okayama, Meguro-ku, Tokyo, 152-8552,, Japan
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Abstract

A strong adhesion of two silica glasses or a silica glass and a different glass that creates properties of heatproof, no adhesive strain, and high transmittance in the region of ultraviolet [UV] was demonstrated with photochemical reaction by vacuum-ultraviolet [V-UV] light. It was confirmed that the adhesive strength of the silicone oil between the two silica glasses enhanced to 18 [MPa] after irradiation from 0 [MPa] before irradiation, that of the SiO2 and BK7 to 12.3 [MPa], and that of the SiO2 and TEMPAX®, to 10 [MPa], and that of the SiO2 and CLEARCERAM® to 7.4 [MPa]. Furthermore, the adhesive strain of the bonded sample was measured by 3-dimension roughness meter (ZYGO), and the results showed no adhesive strain. This sample had the bonding strength at 500 degrees Celsius.

Type
Research Article
Copyright
Copyright © Materials Research Society 2008

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References

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New method of photochemical adhesion of fused silica glasses by using Xe2 excimer lamp
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