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Multilayer Fresnel Zone Plate For 8KeV X-Ray by DC Magnetron Sputtering Deposition

Published online by Cambridge University Press:  10 February 2011

S. Tamura
Affiliation:
Osaka National Research Institute, AIST, Ikeda, Osaka, Japan
K. Mori
Affiliation:
Osaka Institute of Technology, Ohmiya, Asahi-ku, Osaka, Japan
T. Maruhashi
Affiliation:
Osaka Institute of Technology, Ohmiya, Asahi-ku, Osaka, Japan
K. Yoshida
Affiliation:
Osaka Institute of Technology, Ohmiya, Asahi-ku, Osaka, Japan
K. Ohtani
Affiliation:
Osaka National Research Institute, AIST, Ikeda, Osaka, Japan
N. Kamijyo
Affiliation:
Osaka National Research Institute, AIST, Ikeda, Osaka, Japan
Y. Suzuki
Affiliation:
Advanced Research Laboratory, Hitachi Ltd., Hatoyama, Saitama, Japan
H. Kihara
Affiliation:
Kansai Medical University, Hirakata, Osaka, Japan
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Abstract

Hard X-ray microprobes from synchrotron radiation ( SR ) sources should be powerful tools for various fields of research. A Fresnel zone plate ( FZP ) is a promising focusing element for X-ray. In order to develop high performance multilayer FZP for use in hard X-ray region, Ag/C and Cu/Al concentric multilayers were prepared by some deposition parameters. A dependence of the zone boundary structures on the Ar gas pressure was observed: the multilayer prepared at lower Ar gas pressure had smoother zones. Substrate cooling did not improve the zone boundary structures. From the focusing test of the Cu/Al FZP by the SR, a microbeam of 1.3 μ m ø has been obtained for 8 KeV X-ray (λ =0.154nm).

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

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Multilayer Fresnel Zone Plate For 8KeV X-Ray by DC Magnetron Sputtering Deposition
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