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Microstructures of Ultrathin Films of Sputtered PbTiO3

Published online by Cambridge University Press:  15 February 2011

Kiyotaka Wasa
Affiliation:
Research Institute of Innovative Technology for the Earth (RITE), Kizu-cho, Kyoto, 619–02, Japan
T. Satoh
Affiliation:
Research Institute of Innovative Technology for the Earth (RITE), Kizu-cho, Kyoto, 619–02, Japan
K. Tab Ata
Affiliation:
Research Institute of Innovative Technology for the Earth (RITE), Kizu-cho, Kyoto, 619–02, Japan
H. Adachi
Affiliation:
Central Research Laboratories, Matsushita Electric Ind., Co., Seika-cho, Kyoto, 619–02, Japan
Y. Ichikawa
Affiliation:
Central Research Laboratories, Matsushita Electric Ind., Co., Seika-cho, Kyoto, 619–02, Japan
K. Setsune
Affiliation:
Central Research Laboratories, Matsushita Electric Ind., Co., Seika-cho, Kyoto, 619–02, Japan
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Abstract

Ultrathin films of perovskite PbTiO3, 10–100nm thick, were epitaxially grown on miscut (001)SrTiO3 substrate by rf-magnetron sputtering at 600°C. The electron microscope and high resolution x-ray diffraction analysis suggested the evidence of epitaxial growth of (001)PbTiO3/(001)SrTiO3 with three dimensional crystal orientation. The stoichiometric film shows extremely smooth surface with the surface roughness less than 3nm. Deposition on a miscut substrate under stoichiometric conditions is essential to make continuous thin films of single crystal perovskite PbTiO3.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

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