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Low Temperature Deposition of ZnO SiO2 Thin Films on Polymer Surfaces by Plasma Enhanced CVD

Published online by Cambridge University Press:  21 March 2011

Hidetaka Anma
Affiliation:
Koito Manufacturing Co.,Ltd 500,Kitawaki,Shimizu,424-8764, Japan Research Institute of Electronics, Shizuoka University, Hamamatsu, 432-8011, Japan
Yuuji Yoshimoto
Affiliation:
Koito Manufacturing Co.,Ltd 500,Kitawaki,Shimizu,424-8764, Japan
Mariko Tanaka
Affiliation:
Koito Manufacturing Co.,Ltd 500,Kitawaki,Shimizu,424-8764, Japan
Hiroyuki Takatsuka
Affiliation:
Koito Manufacturing Co.,Ltd 500,Kitawaki,Shimizu,424-8764, Japan
Yoshinori Hatanaka
Affiliation:
Research Institute of Electronics, Shizuoka University, Hamamatsu, 432-8011, Japan
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Abstract

ZnO and SiO2 thin films coated on plastic materials were investigated for the protection against solar ultraviolet (UV) radiation and the hard coating. Using diethylzinc (DEZ) as the organic zinc material, we attempt to deposit ZnO thin films on polycarbonate (PC) resin at room temperature by the cathode deposition technique of the plasma enhanced (PE) CVD method. It was found that the rf power and the substrate temperature intensively influenced on the deposition rate. The deposition rate increased with the rf power up to 100W, but decreased with the RF power above 100W, and also decreased with increasing the substrate temperature. In a xenon arc weatherability test, the ZnO-coated PC plates exhibited remarkable protection characteristics against UV radiation. They kept a smooth surface and no- coloring even if UV light irradiated for 1000 hours. Moreover, SiO2film deposited from tetraethoxysilane (TEOS) was over-coated on the ZnO film / PC plates. These films showed a drastic improvement in the hardness. Therefore, these films are expected as the UV-cut and hard coating for the automotive parts.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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References

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