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In-situ Observation of the Formation and Growth of Twin in the Copper Electrodeposits for Ultra Large Scale Integration

Published online by Cambridge University Press:  01 February 2011

Heung Nam Han
Affiliation:
hnhan@snu.ac.kr, Seoul National University, Material Science and Engineering, San 56 -1, Shinrim -dong, Kwanak -gu, Seoul, 151-742, Korea, Republic of, +82-2-880-9240, +82-2-885-9671
Hyo-Jong Lee
Affiliation:
ocma97@hotmail.com, Seoul National University, Material Science and Engineering, San 56-1, Shinrim-dong, Kwanak-gu, Seoul, 151-744, Korea, Republic of
Do Hyun Kim
Affiliation:
dhskidrow@hanmail.net, Seoul National University, Material Science and Engineering, San 56-1, Shinrim-dong, Kwanak-gu, Seoul, 151-744, Korea, Republic of
Ui-hyoung Lee
Affiliation:
boben2@hotmail.com, Seoul National University, Material Science and Engineering, San 56-1, Shinrim-dong, Kwanak-gu, Seoul, 151-744, Korea, Republic of
Pil-Ryung Cha
Affiliation:
cprdream@kookmin.ac.kr, Kookmin University, School of Advanced Materials Engineering, 861-1, Chongnung-dong, Songbuk-gu, Seoul, 136-702, Korea, Republic of
Kyu Hwan Oh
Affiliation:
Kyuhwan@snu.ac.kr, Seoul National University, Material Science and Engineering, San 56-1, Shinrim-dong, Kwanak-gu, Seoul, 151-744, Korea, Republic of
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Abstract

During the self-annealing in the copper electrodeposits for the copper metallization, an in-situ observation of grain growth of the copper at room temperature was performed by using EBSD (electron backscatter diffraction). The thin film structure of the copper electrodeposits after annealing was columnar. New twin was initiated at the front surface of growing twin and grew along the normal direction of the twin boundary between the new and parent twins. It was confirmed that the annealing twin in the copper electrodeposits during the self-annealing have an {111} growth front surface.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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References

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In-situ Observation of the Formation and Growth of Twin in the Copper Electrodeposits for Ultra Large Scale Integration
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