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Influence of deposition chamber pressure and substrate temperature on the properties of fluorescent blue and phosphorescent red OLED deposited by OVPD

Published online by Cambridge University Press:  20 February 2017

Philipp van Gemmern
Affiliation:
Institut für Theoretische Elektrotechnik, RWTH Aachen, Aachen, 52056, Germany
Christoph Zimmermann
Affiliation:
Institut für Theoretische Elektrotechnik, RWTH Aachen, Aachen, 52056, Germany
Phenwisa Niyamakom
Affiliation:
Institute of Physics (IA), RWTH Aachen, Aachen, 52056, Germany
Matthias Wuttig
Affiliation:
Institute of Physics (IA), RWTH Aachen, Aachen, 52056, Germany
Sabine Brand
Affiliation:
Philips Technologie GmbH, Philipsstr. 8, Aachen, 52068, Germany
Holger Schwab
Affiliation:
Philips Technologie GmbH, Philipsstr. 8, Aachen, 52068, Germany
Heinrich Becker
Affiliation:
Merck OLED Materials GmbH, Frankfurt/Main, 65926, Germany
Rocco Fortte
Affiliation:
Merck OLED Materials GmbH, Frankfurt/Main, 65926, Germany
Michael Heuken
Affiliation:
Institut für Theoretische Elektrotechnik, RWTH Aachen, Aachen, 52056, Germany AIXTRON AG, Kackertstr. 15-17, Aachen, 52072, Germany
Holger Kalisch
Affiliation:
Institut für Theoretische Elektrotechnik, RWTH Aachen, Aachen, 52056, Germany
Rolf H. Jansen
Affiliation:
Institut für Theoretische Elektrotechnik, RWTH Aachen, Aachen, 52056, Germany
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Abstract

Organic light-emitting diodes (OLED) offer the potential to replace conventional light sources such as incandescent bulbs and fluorescent tubes. The question which thin-film technology is most favorable to produce OLED on an industrial scale is still unanswered. The most established technology for the deposition of small-molecule organic layers is vacuum thermal evaporation. A comparably novel technology is organic vapor phase deposition (OVPD), which offers some unique features in terms of adjustable process parameters such as deposition chamber pressure (P) and substrate temperature (TS). The impact of these parameters on the morphology of organic single layers as well as on the performance of OLED is mostly unknown. In this work, phosphorescent red OLED were produced with different TS and a strong influence on the device efficiency was found. Atomic force microscopy measurements were conducted to investigate the morphology of the hole injection and hole transport layers of the devices deposited at different TS. In addition to this, the influence of TS and P on the performance of fluorescent blue OLED and the morphology of organic single layers was tested. By varying TS and P for the emission layer only, current efficiencies in the range from 4.3 to 6.8 cd/A were found despite the fact that all devices had the same structure. Atomic force microscopy measurements conducted on organic single layers which were deposited at the same process conditions showed rms values ranging from 1.4 to 57 nm.

Type
Research Article
Copyright
Copyright © Materials Research Society 2009

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References

1. Yang, Fan, Shtein, Max, and Forrest, Stephen R., Nature Materials 4, 37 (2005).CrossRefGoogle Scholar
2. Shtein, Max, Mapel, Jonathan, Benziger, Jay B., and Forrest, Stephen R., Appl. Phys. Lett. 81, 268 (2002).CrossRefGoogle Scholar
3. Shtein, Max, Gossenberger, Herman F., Benziger, Jay B., and Forrest, Stephen R., J. Appl. Phys. 89, 1470 (2001).CrossRefGoogle Scholar

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Influence of deposition chamber pressure and substrate temperature on the properties of fluorescent blue and phosphorescent red OLED deposited by OVPD
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