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Published online by Cambridge University Press: 21 February 2011
Microcrystalline films of SiC.H have been deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) of SiH4+CH4+H2 mixtures with high power density and high H2 dilution, at variable CH4/SiH4 ratios. Their elemental composition, structural, optical and electrical properties have been investigated in order to evidence the influence of hydrogen and carbon on microcrystallinity.
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