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Indentation Load Relaxation Studies of Thin Film-Substrate Systems
Published online by Cambridge University Press: 25 February 2011
Abstract
Results from indentation load relaxation (ILR) tests on thin film-substrate systems are reported. In the case of a 1 pum aluminum film on silicon, the data can be interpreted as reflecting both the properties of the film and the interface between film and substrate. Data from a 37μm TiN film on 304 SS are believed to reflect the combined behavior of the film and substrate.
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- Copyright © Materials Research Society 1986
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