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Electron Cyclotron Resonance Plasma Processing of GaAs-AlGaAs Hemt Structures

Published online by Cambridge University Press:  26 February 2011

S. J. Pearton
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ
F. Ren
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ
J. R. Lothian
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ
T. R. Fullowan
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ
R. F. Kopf
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ
U. K. Chakrabarti
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ
S. P. HUI
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ
A. B. Emerson
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ
S. S. Pei
Affiliation:
AT&T Bell Laboratories, Murray Hill, NJ
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Abstract

The damage introduced into GaAs/AlGaAs HEMT structures during pattern transfer (O2 plasma etching of the PMGI layer in a trilevel resist mask) or gate mesa etching (CCl2F2/O2 or CH4/H2/Ar etching of GaAs selectively to AlGaAs) has been studied. For etching of the PMGI, the threshold O+ ion energy for damage introduction into the AlGaAs donor layer is ∼200 eV. This energy is a function of the PMGI over-etch time. The use of ECR-RF O2 discharges enhances the PMGI etch rate without creating additional damage to the device. Gate mesa etching produces measurable damage in the underlying AlGaAs at DC negative biases of 125–150V. Substantial hydrogen passivation of the Si dopants in the AlGaAs occurs with the CH4 /H2 /Ar mixture. Recovery of the initial carrier concentration in the damaged HEMT occurs at ∼400°C, provided the maximum ion energies were dept to ≤400 eV. Complete removal of residual AIF3 on the CCl2F2/O2 exposed AlGaAs was obtained after H2O and NH4 OH:H2O rinsing while chlorides were removed by H2O alone.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

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References

[1] Seaward, K. L., Moll, N. J., Coulman, D. J., and Stickle, W. F., J. Appl. Phys. 61, 2358 (1987).CrossRefGoogle Scholar
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