Ge dots embedded in Si offer the possibility of Si-based light detection at 1.3-1.55 μm. In this communication, we report a very efficient photo-detector based on a Si/SiGe heterojunction bipolar transistor structure with 10 Ge dot layers (8 ML Ge each) incorporated in the basecollector junction. The device structures were grown using low-temperature molecular beam epitaxy, and fabricated for both normal and edge incidence with no electrical contact to the base. The processed Ge-dot transistor detectors revealed a rather low dark current density, 0.01 mA/cm2 at -2 V. Photoconductivity measurements were performed at room temperature. At 1.31 μm, responsivity values of 50 mA/W at normal incidence have been directly measured at Vce = -4 V, without involving any rescaling factor due to light coupling. This value is a ∼250-fold increase compared to a reference p-i-n diode with the same dot layer structure, due to the current amplification function of the transistor. For a rib waveguide device, a very high responsivity value of about 470 mA/W (Vce = -4V) has been obtained at 1.31 μm. Measurements were also performed at 1.55 μm, and the photo-response of the waveguide phototransistor was 25 mA/W, which is again a large improvement compared with the reference waveguide photodiode (∼1 mA/W). Moreover, time-resolved photoconductivity measurements have been carried out. The results have indicated that the device frequency performance is primarily limited by the emitterbase junction capacitance.