Skip to main content Accessibility help
×
Home

Effects of Sputter-Deposited LaNiO3 Electrode on the Deposition and Properties of Ferroelectric Thin Films

Published online by Cambridge University Press:  10 February 2011

T. B. Wu
Affiliation:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, Republic of China
J. M. Wu
Affiliation:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, Republic of China
C. M. Wu
Affiliation:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, Republic of China
M. J. Shyu
Affiliation:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, Republic of China
M. S. Chen
Affiliation:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, Republic of China
J. S. Doing
Affiliation:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, Republic of China
C. C. Yang
Affiliation:
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, Republic of China
Get access

Abstract

Highly (100)-textured thin film of metallic LaNiO3 (LNO) was grown on the Pt/Ti/SiO2/Si substrates by rf magnetron sputtering at ˜300°C, which was used as a bottom electrode to prepare highly (100)-textured ferroelectric films. Examples on the deposition of PbTiO3, (Pbl−xLax)TiO3, Pb(Zr0.53Ti0.47)O3, Pb[(Mg1/3Nb2/3)1−xTix]O3, and (Ba1−xSrx)TiO3 thin films by rf magnetron sputtering or sol-gel method are shown. A reduction of temperature for perovskite phase formation can be achieved, especially for those difficult to crystallize. The surface roughness of the ferroelectric films is also improved as compared to that of films deposited on conventional Pt electrode. Although the electrical properties of the ferroelectric films are affected by the out-diffusion of LNO when a higher temperature was used in the preparation of the films, under an appropriate processing condition, the highly (100)-textured films can have satisfactory electrical characteristics for application. Moreover, the polarization-fatigue property can be also improved by the use of LNO electrode.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below.

References

1. Olowolafe, J. O., Jones, R. E. Jr., Cambell, A. C., Hegde, R. I., and Mogab, C. J., J. Appl. Phys., 73, (1993), 1764.CrossRefGoogle Scholar
2. Eom, C. B., Rover, R. B. V., Phillips, J. M., Fliming, R. M., Cava, R. J., Marshall, J. H., Werder, D. J., Chen, C. H., and Fork, D. K., Ferroelectric Thin Films III, eds. Mayers, E. R., Tuttle, B. A., Desu, S. B., and Larsen, P. K., Mater. Res. Soc. Symp. Proc., 310, (1993), 145.Google Scholar
3. Vijat, D. P. and Desu, S. B., J. Electrochem. Soc., 140, (1993), 2640.Google Scholar
4. Nakamuna, T., Nakao, Y., Kamisawa, A., and Takasu, H., Jpn. J. Appl. Phys., 33, (1994), 5207.CrossRefGoogle Scholar
5. Ramesh, R., Chan, W. K., Wilkens, B., Gilchrist, H., Sands, T., Tarascon, J. M., Keramidas, V. G., Fork, D. K., Lee, J. L., and Safari, A., Appl. Phys. Lett., 61, (1992), 1537.CrossRefGoogle Scholar
6. Ku, X. Q., Peng, J. L., Li, Z. Y., Ju, H. L., and Green, R. L., Phys. Rev. B, 48, (1993), 1112.Google Scholar
7. Prasad, K. V. R., Varma, K. B. R., Raju, A. R., Satyalakshmi, K. M., Mallya, R. M., and Hegde, M. S., Appl. Phys. Lett., 63, (1993), 1898.CrossRefGoogle Scholar
8. Ichinose, H., Nagano, M., Katsuki, H., and Takagi, H., J. Mater. Sci., 29, (1994), 5115.CrossRefGoogle Scholar
9. Yang, C. C., Chen, M. S., Hong, T. J., Wu, C. M., Wu, J. M., and Wu, T. B., Appl. Phys. Lett., 66, (1995), 2643.CrossRefGoogle Scholar
10. Shyu, M. J., Hong, T. J., Yang, T. J., and Wu, T. B., Jpn. J. Appl. Phys., 34, (1995), 3647.CrossRefGoogle Scholar
11. Chen, M. S., Wu, J. M., and Wu, T. B., Jpn. J. Appl. Phys., 34, (1995), 4870.CrossRefGoogle Scholar
12. Shyu, M. J., Hong, T. J., and Wu, T. B., Matter. Lett., 23, (1995), 222.CrossRefGoogle Scholar
13. Chen, M. S., Wu, T. B., and Wu, J. M., Appl. Phys. Lett., to be published in March, 1996.Google Scholar
14. Jiang, M. C. and Wu, T. B., J. Mater. Res., 9, (1994), 1879.CrossRefGoogle Scholar
15. Lin, L. J. and Wu, T. B., Mater. Lett., 11, (1991), 222.Google Scholar
16. Wu, C. M., Hong, T. J., and Wu, T. B., to be published.Google Scholar
17. Klein, J. D., Yen, A., and Clauson, S. L., Epitaxial Oxide Thin Films and Heterostructure, eds. Fork, D. K., Phillips, J. M., Ramesh, R. and Wolf, R. M., Mater. Res. Soc. Symp. Proc., 341, (1994), 393.Google Scholar

Full text views

Full text views reflects PDF downloads, PDFs sent to Google Drive, Dropbox and Kindle and HTML full text views.

Total number of HTML views: 0
Total number of PDF views: 4 *
View data table for this chart

* Views captured on Cambridge Core between September 2016 - 26th January 2021. This data will be updated every 24 hours.

Hostname: page-component-898fc554b-z76t5 Total loading time: 0.414 Render date: 2021-01-26T16:00:58.495Z Query parameters: { "hasAccess": "0", "openAccess": "0", "isLogged": "0", "lang": "en" } Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": false, "newCiteModal": false }

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Effects of Sputter-Deposited LaNiO3 Electrode on the Deposition and Properties of Ferroelectric Thin Films
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

Effects of Sputter-Deposited LaNiO3 Electrode on the Deposition and Properties of Ferroelectric Thin Films
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

Effects of Sputter-Deposited LaNiO3 Electrode on the Deposition and Properties of Ferroelectric Thin Films
Available formats
×
×

Reply to: Submit a response


Your details


Conflicting interests

Do you have any conflicting interests? *