Published online by Cambridge University Press: 29 August 2012
Graphene, with unique electrical, optical and mechanical properties is a promising material in industrial applications, such as batteries, supercapacitors, transistors and semiconductor devices. These potential applications of graphene have motivated the development of large-scale synthesis of graphene on copper substrates by chemical vapor deposition (CVD). To enable practical applications of large-area, high quality graphene layers at the centimeter and wafer scales, process control needs to be implemented for optimizing the morphology and electrical properties and enable repeatable growth-cycle of graphene layers for process-line implementation. Here we investigate the effects of process quartz-tube position on the structural properties of graphene. Furthermore, we describe a procedure for process optimization of the growth parameters. Graphene is grown on copper foils by CVD, and transferred to the SiO2/Si and glass substrates. The detailed characterization of the graphene layers are conducted using Raman spectroscopy, optical microscopy (OM), scanning electron microscopy (SEM) and UV-vis spectroscopy. The experimental results show that the position of copper foil into the quartz tube plays a significant role in the Raman features of the graphene, and influences the optical, morphology and surface properties of graphene layers. We believe that these results will be useful for determining the optimum processing conditions of high quality graphene layers at the centimeter and wafer scales.
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