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Effect of Bombardment of High Energy Ions onto Growing Surface on Structure and Properties of Sputtered Magnetic Films

Published online by Cambridge University Press:  25 February 2011

N. Terada
Affiliation:
Electrotechnical Laboratory, 1–1–4 Umezono, Sakura-mura, Ibaraki, Japan
M. Naoe
Affiliation:
Tokyo Institute of Technology, 2–12–1 Oh-okayama, Meguro-ku, Tokyo, Japan
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Abstract

Magnetic thin films (Co-Ta, Co-Zr and pure iron films) have been deposited by means of dual ion beam sputtering and the effect of bombardment of high energy ions onto growing surface on their structure and properties has been investigated. The bombardment of argon ions with proper kinetic energy has the effects as follows;I. suppression of growth of crystallites, II. improvement of structural ordering in micro-scale and III. improvement of structural uniformity in macro-scale. Therefore, the films deposited with the proper bombardment are composed of fine crystallites with good atomic ordering. This causes an increase of 4лMs and reduction of Hc of the films;Co-Zr:4лMs=16 kG, Hc<0.6 Oe, Co-Ta:4лMs=15 kG,Hc<0.3 Oe and iron films:4лMs=21 kG,Hc=l Oe.

Type
Research Article
Copyright
Copyright © Materials Research Society 1986

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References

1.Heiman, N. and Kazama, N.;Phys. Rev., B17, 2215 (1978).CrossRefGoogle Scholar
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8.Naoe, M., Yamaga, M. and Terada, N.;IEEE Trans. Magn., MAG–21 (1985) to be published.Google Scholar

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