Skip to main content Accessibility help
×
Home
Hostname: page-component-78dcdb465f-mrc2z Total loading time: 0.626 Render date: 2021-04-18T05:59:07.131Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": false, "newCiteModal": false, "newCitedByModal": true }

Double Beam Photoconductivity Modulation System and its Application to the Characterization of a Process of Photoresist Removal

Published online by Cambridge University Press:  25 February 2011

A. Usami
Affiliation:
Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466, Japan
H. Fujiwara
Affiliation:
Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466, Japan
T. Nakai
Affiliation:
Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466, Japan
K. Matsuki
Affiliation:
DAINIPPON SCREEN Mfg. Co., Ltd, Furukawa-cho, Hazukashi, Fushimi-ku, Kyoto 612, Japan
T. Takeuchi
Affiliation:
DAINIPPON SCREEN Mfg. Co., Ltd, Furukawa-cho, Hazukashi, Fushimi-ku, Kyoto 612, Japan
T. Wada
Affiliation:
Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466, Japan
Get access

Abstract

A laser/microwave method using two lasers of different wavelengths for carrier injection is proposed to evaluate near surface regions. These lasers are a He-Ne (wavelength=633nm, penetration depth=∼3μm) and a YAG lasers (wavelength=1060nm, penetration depth=∼500μm). Using a microwave probe, the amount of injected excess carriers can be detected. The carrier concentration is mainly dependent on the condition of the surface when carriers are excited by the He-Ne laser. It is mainly dependent on the condition of the bulk region when carriers are excited by YAG laser. We refer to microwave intensities detected by the He-Ne and the YAG lasers as the surface-recombination-velocity-related microwave intensity (SRMI) and bulkrelated microwave intensity (BRMI), respectively. We refer to the difference between SRMI and BRMI as relative SRMI (R-SRNI), which is closely related to the condition of surface and surface active region. We evaluate the near surface regions of the samples after plasma and wet etching for removing the photoresist layer. And we evaluate the near surface regions of the samples after a heat treatment which is done to recover the damage introduced by plasma etching. It is found that the R-SRMI method is better suited to near surface region evaluation than conventional lifetime measurements.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below.

References

1. Abe, T., OYO BUTURI 59 pp.272 (1990)(in Japanese)Google Scholar
2. Usami, A., Yamada, N., Matsuki, K., Takeuchi, T. and Wada, T., J. Crystal Growth 103 pp.179 (1990)CrossRefGoogle Scholar
3. Usami, A., Yamada, N., Matsuki, K., Takeuchi, T. and Wada, T., Mat. Res. Soc. Symp. Proc. 146 pp. 359 (1989)CrossRefGoogle Scholar
4. Usami, A., Fujiwara, H., Yamada, N., Matsuki, K., Takeuchi, T. and Wada, T., The Institute of Electronics, Information and Communication Engineers (IEICE) Transaction on Electronics (to be published)Google Scholar
5. Usami, A., Proc.IEEE Int. Conference on Microelectronic Test Structure, Vol. 4 No. 1 pp.1 (1991)Google Scholar
6. Usami, A., Jintate, S. and Kudo, B., OYO BUTURI 49 pp.1192 (1980) (in Japanese)Google Scholar
7. Usami, A. and Kushida, T., OYO BUTURI 50 pp.607 (1981) (in Japanese)Google Scholar
8. Usami, A., Shiraki, H., Fujiwara, H., Abe, R., Osamura, N., Ichimura, M. and Wada, T., Mat. Res. Soc. Symp. Proc. 224 pp.215 (1991)CrossRefGoogle Scholar
9. Fuller, C.S., DitzenberFer, J.A., Hannay, N.B. and Buehler, E., Phys. Rev. 96 pp.833 (1954)Google Scholar
10. Tokuda, Y., Shimizu, N. and Usami, A., Jpn.J.Appl Phys. 18 No.2 pp.309 (1979)CrossRefGoogle Scholar

Full text views

Full text views reflects PDF downloads, PDFs sent to Google Drive, Dropbox and Kindle and HTML full text views.

Total number of HTML views: 0
Total number of PDF views: 5 *
View data table for this chart

* Views captured on Cambridge Core between September 2016 - 18th April 2021. This data will be updated every 24 hours.

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Double Beam Photoconductivity Modulation System and its Application to the Characterization of a Process of Photoresist Removal
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

Double Beam Photoconductivity Modulation System and its Application to the Characterization of a Process of Photoresist Removal
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

Double Beam Photoconductivity Modulation System and its Application to the Characterization of a Process of Photoresist Removal
Available formats
×
×

Reply to: Submit a response


Your details


Conflicting interests

Do you have any conflicting interests? *