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Deposition of Lead-Silicate Glassy Thin Coatings by Rf Magnetron Sputtering: Correlation Between Deposition Parameters and Electrical and Structural Properties

Published online by Cambridge University Press:  21 February 2011

V. Rigato
Affiliation:
INFN, Laboratori Nazionali di Legnaro, 35020 Legnaro (Pd), Italy INFM, Dipartimento di Fisica, Université di Padova, 35131 Padova, Italy
G. Maggioni
Affiliation:
INFN, Laboratori Nazionali di Legnaro, 35020 Legnaro (Pd), Italy
D. Boscarino
Affiliation:
INFN, Laboratori Nazionali di Legnaro, 35020 Legnaro (Pd), Italy
G. Della Mea
Affiliation:
INFN, Laboratori Nazionali di Legnaro, 35020 Legnaro (Pd), Italy Dipartimento di Ingegneria dei Materiali, Università di Trento, 38050 Mesiano, Italy
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Abstract

Thin films (100–400 nm) of lead silicate glass have been deposited by RF magnetron sputtering in Ar plasma at different discharge conditions. The interaction of the sputtered species with the gas atoms during the transport process through the discharge region and the kinetics of growth of the films have been investigated as a function of the target composition and of the substrate temperature. This study demonstrates the possibility of controlling the surface electrical resistance of the films in a wide range of values ranging from 1012 to 1017 during the film growth.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

1 R. Bouclier, R., Garabatos, C., Manzin, G., Sauli, F., Shekhtman, L., Temmel, T., Della Mea, G., Maggioni, G., Rigato, V., Logachenko, I. IEEE Trans. Nucl. Sci. NS 41[4], 821 (1994).CrossRefGoogle Scholar
2 Delia Mea, G., Rigato, V., Maggioni, G., Zandolin, S., Boscarino, D., Carturan, S., Pieri, U., Bolzan, E., Sauli, F., Pivin, J.C., Proc. Int. Conf. on Microstrip Gas Chambers, pp. 3038, Ed. Progetto, Padova (Italy) 1995 Google Scholar
3 Bouclier, R., Capeans, M., Garabatos, C., Manzin, G., Million, G., Ropelewski, L., Sauli, F., Shefer, E., Shekhtman, L., Temmel, T., Della Mea, G., Maggioni, G., Rigato, V., Proc. Int. Conf. on Microstrip Gas Chambers, pp. 3947, Ed. Progetto, Padova (Italy) 1995 Google Scholar
4 Bouclier, R., Capeans, M., Garabatos, C., Manzin, G., Million, G., Ropelewski, L., Sauli, F., Shekhtman, L., Temmel, T., Delia Mea, G., Maggioni, G., Rigato, V., CERN-PPE/95–37, 13 March 1995 Google Scholar
5 Delia Mea, G., Rigato, V., Maggioni, G., Granozzi, G., Sassi, A., Colombo, P., Proceedings of the Second Conference of the European Society of Glass Science and Technology, 21–24 June 1993, Venice, Italy, pp. 333–338. Supplemento a “Rivista della Stazione Sperimentale del Vetro” vol XXIII, 1993.Google Scholar
6 Rigato, V., Boscarino, D., Maggioni, G., Mariotto, G., Pivin, J.C. and Della Mea, G., paper presented at Radiation Effects on Insulators International Conference REI 8, Catania (Italy) 11– 15th September 1995, accepted for publication in Nucl. Instrum. Meth. B (1996)Google Scholar
7 Della Mea, G., Rigato, V., Dal Maschio, R., Sighel, C., Colombo, P., J. Am. Ceram. Soc. 76, [11], 2930(1993).Google Scholar
8 For the proper operation of these detectors, coated areas wider than 10×10cm2 with homogeneous electrical properties and thickness within few percents are needed.Google Scholar
9 The glass targets were made and stoichiometrically analized by Stazione Sperimentale del Vetro di Murano, Venice, Italy.Google Scholar
10 The elemental contents reported in table I where calculated from the RBS spectra using the value of the detector solid angle affected by 5% uncertainty. This parameter did not enter the calculations of the stoichiometric ratios.Google Scholar
11 The calculated density is given by the following expression: Di= APb (Nt)i pb + ASi (Nt)i si + A0 (Nt)i 0 ti where Di and ti are the density and the thickness of sample i (i=l to 7), respectively; APb , ASi and AO are the atomic weights (in grams) of Pb, Si and O, respectively; (Nt)i pb, (Nt)i si and (Nt)i O are the elemental contents of Pb, Si and O, respectively, as given in Tab. I.Google Scholar
12 Rigato, V., Maggioni, G., Delia Mea, G., Surf. Coat. Tech. 7475 (1995), 173.Google Scholar
13 Müller, K.-H., J. Appl. Phys. 58 (7), (1985), 2573; J. Vac. Sei. Technol. A 4(2), 184 (1986)CrossRefGoogle Scholar

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Deposition of Lead-Silicate Glassy Thin Coatings by Rf Magnetron Sputtering: Correlation Between Deposition Parameters and Electrical and Structural Properties
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Deposition of Lead-Silicate Glassy Thin Coatings by Rf Magnetron Sputtering: Correlation Between Deposition Parameters and Electrical and Structural Properties
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Deposition of Lead-Silicate Glassy Thin Coatings by Rf Magnetron Sputtering: Correlation Between Deposition Parameters and Electrical and Structural Properties
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