Skip to main content Accessibility help
×
Home
Hostname: page-component-78dcdb465f-2ktwh Total loading time: 0.817 Render date: 2021-04-17T03:31:19.226Z Has data issue: true Feature Flags: { "shouldUseShareProductTool": true, "shouldUseHypothesis": true, "isUnsiloEnabled": true, "metricsAbstractViews": false, "figures": false, "newCiteModal": false, "newCitedByModal": true }

Deactivation of Ultra Shallow B and BF2 Profiles After Non-melt Laser Annealing

Published online by Cambridge University Press:  01 February 2011

Jim Sharp
Affiliation:
j.sharp@surrey.ac.uk, University of Surrey, School of Electronics and Physical Sciences, Advanced Technology Institute, Guildford, Surrey, GU2 7XH, United Kingdom
Nicholas E.B Cowern
Affiliation:
nick.cowern@surrey.ac.uk, University of Surrey, Ion Beam Centre, Advanced Technology Institute, School of Electronics and Physical Sciences, Guildford, Surrey, GU2 7XH, United Kingdom
Roger P. Webb
Affiliation:
r.webb@surrey.ac.uk, University of Surrey, Ion Beam Centre, Advanced Technology Institute, School of Electronics and Physical Sciences, Guildford, Surrey, GU2 7XH, United Kingdom
Damiano Giubertoni
Affiliation:
giuberto@itc.it, ITC-irst, Trento, N/A, 38050, Italy
Salvotore Gennaro
Affiliation:
gennaro@itc.it, ITC-irst, Trento, N/A, 38050, Italy
Massimo Bersani
Affiliation:
bersani@itc.it, ITC-irst, Trento, N/A, 38050, Italy
Majeed A. Foad
Affiliation:
majeed_foad@amat.com, Applied Implant Technologies, 974 E. Arques Avenue, Sunnyvale, California, 94086, United States
Karen J. Kirkby
Affiliation:
k.kirkby@surrey.ac.uk, University of Surrey, Ion Beam Centre, Advanced Technology Institute, School of Electronics and Physical Sciences, Guildford, Surrey, GU2 7XH, United Kingdom
Get access

Abstract

Ultra-shallow B and BF2 implants in silicon pre-amorphised with Ge have been activated using a scanning non-melt laser. The implants were activated either by using 1 or 10 laser scans. Isochronal 60s post-laser annealing between 700-1000°C were then undertaken to study the deactivation and reactivation of the B. Both B and BF2 samples were implanted with a dose of 1x1015 B cm-2 at an effective energy of 500eV. The presence of F from the BF2 implants, which is superimposed over the boron profile increases the sheet resistance of the initial fabricated junction (from 600-700 Ω/sq from B implants only to 750-1100 Ω/sq for BF2 implants). Fluorine also changes the deactivation and reactivation behaviour of the boron during the post-anneals by increasing the amount of deactivation of the boron.

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below.

References

1 International Technology Roadmap for Semiconductors, (2006).Google Scholar
2 Michel, A.E., Rausch, W., Ronsheim, P.A. and Kastl, R.H., Appl. Phys. Lett. 50, 416, (1987).CrossRefGoogle Scholar
3 Pawlak, B.J., Surdeanu, R., Colombeau, B., Smith, A.J., Cowern, N.E.B., Lindsay, R., Vandervorst, W., Brijs, B., B.; Richard, O., and Cristiano, F., Appl. Phys. Lett. 84, 20552057 (2004).CrossRefGoogle Scholar
4 Colombeau, B., Smith, A.J., Cowern, N.E.B., Pawlak, B.J., Cristiano, F., Duffy, R., Claverie, A., Ortiz, C.J., Pichler, P., Lampin, E., and Zechner, C., Materials Research Society Symposium Proceedings 810, 91102 (2004).CrossRefGoogle Scholar
5 Felch, S.B., Graoui, H., Tsai, G. and Mayur, A., Nucl. Inst. Meth. Phys. B, 237, 35, (2005).CrossRefGoogle Scholar
6 Earles, S., Law, M., Jones, K., Talwar, S. and Corcoran, S., Mater. Res. Soc. Symp. Proc. 669, J4.1.1 (2001).CrossRefGoogle Scholar
7 Lerch, W., Paul, S., Niess, J., McCoy, S., Selinger, T., Gelpey, J., Cristiano, F., Severac, F., Gavelle, M., Boninelli, S., Pichler, P. and Bolze, D., Mat. Sci. Eng., B. 124–125, 24 (2005).CrossRefGoogle Scholar
8 Cowern, N. E. B., Colombeau, B., Benson, J., Smith, A. J., Lerch, W., Paul, S., Graf, T., Cristiano, F., Hebras, X. and Bolze, D., Appl. Phys. Lett. 86, 101095 (2005).CrossRefGoogle Scholar

Full text views

Full text views reflects PDF downloads, PDFs sent to Google Drive, Dropbox and Kindle and HTML full text views.

Total number of HTML views: 0
Total number of PDF views: 8 *
View data table for this chart

* Views captured on Cambridge Core between September 2016 - 17th April 2021. This data will be updated every 24 hours.

Send article to Kindle

To send this article to your Kindle, first ensure no-reply@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about sending to your Kindle. Find out more about sending to your Kindle.

Note you can select to send to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be sent to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Deactivation of Ultra Shallow B and BF2 Profiles After Non-melt Laser Annealing
Available formats
×

Send article to Dropbox

To send this article to your Dropbox account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Dropbox.

Deactivation of Ultra Shallow B and BF2 Profiles After Non-melt Laser Annealing
Available formats
×

Send article to Google Drive

To send this article to your Google Drive account, please select one or more formats and confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your <service> account. Find out more about sending content to Google Drive.

Deactivation of Ultra Shallow B and BF2 Profiles After Non-melt Laser Annealing
Available formats
×
×

Reply to: Submit a response


Your details


Conflicting interests

Do you have any conflicting interests? *