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Assembly of thin Film Dielectrics by Sequential Adsorption Reactions of Unilamellar Inorganic Colloids

Published online by Cambridge University Press:  10 February 2011

Mingming Fang ,
Chy Hyung Kim ,
Anthony C. Sutorik ,
David M. Kaschak  and
Thomas E. Mallouk
Mingming Fang
Affiliation:
Department of Chemistry, The Pennsylvania State University, University Park, PA 16802
Chy Hyung Kim
Affiliation:
Department of Chemistry, Chongju University, 36 Naedok-Dong, Chongju-Shi, Korea
Anthony C. Sutorik
Affiliation:
Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI 48109
David M. Kaschak
Affiliation:
Department of Chemistry, The Pennsylvania State University, University Park, PA 16802
Thomas E. Mallouk
Affiliation:
Department of Chemistry, The Pennsylvania State University, University Park, PA 16802
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Abstract

Several layered inorganic materials (e.g. KCa2Nb3O10, KTiNbO5, and CsPb2Nb3O10) were prepared and their alkali cations exchanged by in aqueous acid. A fraction of the interlayer protons of HCa2Nb3O10 and HTiNbO5 can be replaced by tetra-n-butylammonium (TBA+), by reaction with TBA+OH. Intercalation of a sufficient amount of TBA+ causes complete exfoliation, and single, nanometer-thick sheets of these materials are thus obtained. By sequential adsorption of these two-dimensional colloidal polyanions and polymeric cations, monolayer sheets of layered perovskites can be stacked on silicon surfaces to give thin films of any desired thickness. The layered materials, the exfoliated colloids, and the thin film multilayers on silicon were studied by X-ray diffraction, transmission electronic microscopy (TEM), ellipsometry, and atomic force microscopy (AFM). The dielectric properties of the related bulk materials were measured, and are also discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 446: Amorphous and Crystalline Insulating Thin Films–1996 , 1996 , 377
Copyright
Copyright © Materials Research Society 1997

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