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Application of Ripple Pyrometry on Integra Rapid Thermal CVD Cluster Tools

Published online by Cambridge University Press:  15 February 2011

G. C. Xing
Affiliation:
AG Processing Technology, Inc., Sunnyvale, CA
Z. H. Wang
Affiliation:
Luxtron Corporation, Santa Clara, CA
C. Schietinger
Affiliation:
Luxtron Corporation, Santa Clara, CA
Y. Wasserman
Affiliation:
AG Processing Technology, Inc., Sunnyvale, CA
M. H. Sun
Affiliation:
Luxtron Corporation, Santa Clara, CA
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Abstract

This paper presents the application of ripple pyrometry on AG Associates Integra systems which are three phase powered and multi-zone controlled rapid thermal CVD cluster tools. Two types of sensor configurations were explored for optimum emissivity compensated temperature measurement performance. It was found that it is very difficult to measure temperature when a two sensor configuration is used due primarily to the chamber and reflector architecture. Good temperature measurement was obtained at high temperatures when zone ratios between the wafer and lamp sensors were aligned. It was also found that the temperature signal to noise ratio is very sensitive to ripple quality and zone ratio alignment accuracy.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

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