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Anomalous Transient Tail Diffusion of Boron in Silicon: Kinetic Modeling of Diffusion and Cluster Formation
Published online by Cambridge University Press: 25 February 2011
Abstract
A kinetic modeling approach is used together with experimental studies to gain insight into the processes taking place during anomalous transient diffusion. A physical process analogous to B clustering is found to play an important role, even at B concentrations well below the solid solubility limit.
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- Research Article
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- Copyright © Materials Research Society 1990
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