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Subwavelength Grating Structure with High Aspect Ratio and Tapered Sidewall Profiles

  • W. Yu (a1), D. Wu (a1), X. Duan (a2) and Y. Yi (a1) (a2)

Abstract

CMOS-compatible fabrication and etching processes are often used in subwavelength grating structures manufacturing, it normally generates tapered sidewall profile of the gratings. In this work, we have studied the impacts on resonance mode characteristics of subwavelength grating structures due to the tapered sidewall profile, as well as grating with high aspect ratio. Our simulation results have revealed that both of these two factors play important roles on the resonance mode behavior of subwavelength grating devices. We also discussed the mechanism between the guided mode resonance and the grating cavity mode resonance. Our study will provide guidance for a series of integrated photonics devices applications, such as compact optical filter, photonics amplifier, and lasers, while the realistic subwavelength grating structure is considered.

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Corresponding author

*e-mail: yys@alum.mit.edu

References

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