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Focused Ion Beam Fabrication of SU-8 Waveguide Structures on Oxidized Silicon

  • Swagata Samanta (a1), Pallab Banerji (a2) and Pranabendu Ganguly (a1)

Abstract

This work deals with SU-8 waveguides and waveguide structures fabricated on an oxidized silicon substrate using ‘Focused ion beam (FIB) lithography’. From our experimentation it seems that FIB method is practically not suitable for fabricating long SU-8 waveguide structures, rather it is more suitable for nanoscale modification of already fabricated waveguides, such as, to fabricate photonic crystal structures.

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References

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Keywords

Focused Ion Beam Fabrication of SU-8 Waveguide Structures on Oxidized Silicon

  • Swagata Samanta (a1), Pallab Banerji (a2) and Pranabendu Ganguly (a1)

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