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Vanadium Oxide Thin Film by Aqueous Spray Deposition

Published online by Cambridge University Press:  10 July 2018

Seth Calhoun
Affiliation:
Physics Department, University of Central Florida, Orlando, FL, United States.
Rachel Evans
Affiliation:
Physics Department, University of Central Florida, Orlando, FL, United States.
Cameron Nickle
Affiliation:
Physics Department, University of Central Florida, Orlando, FL, United States.
Isaiah O. Oladeji
Affiliation:
SISOM Thin Films LLC, 1209 W. Gore St. Orlando FL 32805
Justin Cleary
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson AFB, OH, United States.
Evan M Smith
Affiliation:
Air Force Research Laboratory, Sensors Directorate, Wright-Patterson AFB, OH, United States.
Sayan Chandra
Affiliation:
Physics Department, University of Central Florida, Orlando, FL, United States.
Debashis Chanda
Affiliation:
Physics Department, University of Central Florida, Orlando, FL, United States.
Robert E. Peale
Affiliation:
Physics Department, University of Central Florida, Orlando, FL, United States.
Corresponding
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Abstract

Vanadium Oxide has application to infrared bolometers due to high temperature coefficient of resistivity (TCR). It has attracted interest for switchable plasmonic devices due to its metal to insulator transition near room temperature. We report here the properties of vanadium oxide deposited by an aqueous spray process. The films have a ropy surface morphology with ∼70 nm surface roughness. The polycrystalline phase depends on annealing conditions. The films have TCR of ∼2%/deg, which compares well with sputtered films. Only weak evidence is found for an insulator-metal phase transition in these films.

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Copyright
Copyright © Materials Research Society 2018 

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