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Optimal Noise Filters in High-Resolution Electron Microscopy

  • Kazuo Ishizuka (a1), Paul H. C. Eilers (a2) and Toshihiro Kogure (a3)

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Most of the specimens for high-resolution electron microscopy have amorphous surface layers due to contamination during observation and/or damaged surface layers during specimen preparation. Moreover, many specimens are radiation sensitive, and a part of the specimen easily becomes amorphous during the observation. These amorphous materials make clear observation of crystal structure difficult. A periodic structure may be extracted by simply using a periodic mask in Fourier space. However, this kind of mask often introduces a periodic feature in addition to the crystal structure. To reduce such artifacts a Wiener filter or an average background subtraction filter has been discussed. However, these filters do not work for non-ideal crystals, such as cylindrical crystals and nano-crystals, where a translational periodicity is limited to the order of nano-meter. In this report we improve these filters by introducing new ways to estimate a contribution from the amorphous materials.

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References

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[1] Marks, L.D., Ultramicroscopy 62 (1996) 4352.
[2] Kilaas, R., J. Microscopy 190(1997)4551.
[3] Eilers, P.H.C. et al., Computational Statistics and Data Analysis 50 (2006) 6176.

Optimal Noise Filters in High-Resolution Electron Microscopy

  • Kazuo Ishizuka (a1), Paul H. C. Eilers (a2) and Toshihiro Kogure (a3)

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