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Ways to Suppress Electron Beam Damage Using High-Speed Electron Beam Control by Electrostatic Shutter in Sample Observation and Analysis

Published online by Cambridge University Press:  22 July 2022

Hiroki Hashiguchi ,
Kazuki Yagi ,
Yu Jimbo ,
Ryusuke Sagawa ,
Ruth Shewmon Bloom ,
Bryan Reed ,
Sang Tae Park ,
Daniel J. Masiel  and
Ichiro Ohnishi
Hiroki Hashiguchi*
Affiliation:
JEOL Ltd. Akishima, Tokyo, Japan
Kazuki Yagi
Affiliation:
JEOL Ltd. Akishima, Tokyo, Japan
Yu Jimbo
Affiliation:
JEOL Ltd. Akishima, Tokyo, Japan
Ryusuke Sagawa
Affiliation:
JEOL Ltd. Akishima, Tokyo, Japan
Ruth Shewmon Bloom
Affiliation:
Integrated Dynamic Electron Solution Inc., Pleasanton, CA, USA
Bryan Reed
Affiliation:
Integrated Dynamic Electron Solution Inc., Pleasanton, CA, USA
Sang Tae Park
Affiliation:
Integrated Dynamic Electron Solution Inc., Pleasanton, CA, USA
Daniel J. Masiel
Affiliation:
Integrated Dynamic Electron Solution Inc., Pleasanton, CA, USA
Ichiro Ohnishi
Affiliation:
JEOL Ltd. Akishima, Tokyo, Japan
*
*Corresponding author: hhashigu@jeol.co.jp

Abstract

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Type
Electron Microscopy of Beam Sensitive Samples: The Trials and Tribulations of Electron-beam Sample Interactions
Information
Microscopy and Microanalysis , Volume 28 , Supplement S1 , August 2022 , pp. 2200 - 2201
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Copyright
Copyright © Microscopy Society of America 2022

References

Ooe, K et al. , Ultramicroscopy 220 (2021), p.113133.CrossRefGoogle Scholar