Hostname: page-component-76fb5796d-vvkck Total loading time: 0 Render date: 2024-04-25T20:30:26.294Z Has data issue: false hasContentIssue false
  • English
  • Français

To-and-Fro Motion of W5Si3 on a β-Si3N4 Substrate at Elevated Temperatures

Published online by Cambridge University Press:  28 March 2002

S. Arai ,
K. Suzuki  and
H. Saka
S. Arai
Affiliation:
Center for Integrated Research in Science and Technology, Nagoya University, Nagoya 464-8603, Japan
K. Suzuki
Affiliation:
Department of Quantum Engineering and Department of Materials Science and Engineering, Nagoya University, Nagoya 464-8603, Japan
H. Saka
Affiliation:
Department of Quantum Engineering and Department of Materials Science and Engineering, Nagoya University, Nagoya 464-8603, Japan
Get access

Abstract

Behavior of fine crystalline particles of W5Si3 on a β-Si3N4 substrate at high temperatures was observed by an in situ heating experiment in a transmission electron microscope. Some of the fine particles of W5Si3 moved in a to-and-fro manner.

Keywords

fine particlesto-and-fro motionin situ heating experimentW5Si3β-Si3N4
Type
Research Article
Information
Microscopy and Microanalysis , Volume 8 , Issue 1 , February 2002 , pp. 16 - 20
Copyright
© 2002 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)