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To-and-Fro Motion of W5Si3 on a β-Si3N4 Substrate at Elevated Temperatures

  • S. Arai (a1), K. Suzuki (a2) and H. Saka (a2)

Abstract

Behavior of fine crystalline particles of W5Si3 on a β-Si3N4 substrate at high temperatures was observed by an in situ heating experiment in a transmission electron microscope. Some of the fine particles of W5Si3 moved in a to-and-fro manner.

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Corresponding author

Department of Quantum Engineering and Department of Materials Science and Engineering, Nagoya University, Nagoya 464-8603, Japan

Keywords

To-and-Fro Motion of W5Si3 on a β-Si3N4 Substrate at Elevated Temperatures

  • S. Arai (a1), K. Suzuki (a2) and H. Saka (a2)

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