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Ta/Cu1−x Ndx/NiFe/Ta Layers Characterized Using TEM/Microanalysis Techniques

Published online by Cambridge University Press:  05 August 2019

Jian-Guo Zheng ,
Qian Chen  and
Ya Zhai
Jian-Guo Zheng*
Affiliation:
Irvine Materials Research Institute, University of California, Irvine, CA, USA.
Qian Chen
Affiliation:
School of Physics, Southeast University, Nanjing, People's Republic ofChina.
Ya Zhai
Affiliation:
School of Physics, Southeast University, Nanjing, People's Republic ofChina.
*
*Corresponding author: jzheng@uci.edu

Abstract

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Type
Microscopy and Microanalysis for Real-World Problem Solving
Information
Microscopy and Microanalysis , Volume 25 , Supplement S2 , August 2019 , pp. 756 - 757
Copyright
Copyright © Microscopy Society of America 2019 

References

[1]The Ta/Cu1−xNdx/NiFe/Ta films were fabricated at Southeast University. The authors would acknowledge the use of IMRI facilities at UCI for the FIB and TEM work.Google Scholar