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Plasma Focused Ion Beam Curtaining Artifact Correction by Fourier-Based Linear Opti-mization Model

Published online by Cambridge University Press:  01 August 2018

Christopher W. Schankula ,
Christopher K. Anand  and
Nabil D. Bassim
Christopher W. Schankula
Affiliation:
Department of Computing and Software (CAS), McMaster University, Hamilton, Ontario, Canada
Christopher K. Anand
Affiliation:
Department of Computing and Software (CAS), McMaster University, Hamilton, Ontario, Canada
Nabil D. Bassim
Affiliation:
Department of Materials Science and Engineering (MSE), McMaster University, Hamilton, Ontario, Canada

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 24 , Supplement S1: Proceedings of Microscopy & Microanalysis 2018 , August 2018 , pp. 588 - 589
Copyright
© Microscopy Society of America 2018 

References

References:

[1] Burnett, T, et al., Ultramicroscopy 161 2016) p 119–129.Google Scholar
[2] Fitschen, JH, Ma, J Schuff, S Computer Vision and Image Understanding 155 2017) p 24–32.Google Scholar
[3] The authors acknowledge funding from NSERC and McMaster’s MSE department. We thank Prof. Kay Wille for preparing the UHPC sample and Ron Kelley & Brandon Van Leer of FEI-Thermo Fisher for the imaging.Google Scholar