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Opportunities and Challenges in APT Metrology for Semiconductor Applications

Published online by Cambridge University Press:  05 August 2019

Claudia Fleischmann ,
Ramya Cuduvally ,
Richard Morris ,
Davit Melkonyan ,
Jonathan Op de Beeck ,
Igor Makhotkin ,
Paul van der Heide  and
Wilfried Vandervorst
Claudia Fleischmann*
Affiliation:
imec, Leuven, Belgium.
Ramya Cuduvally
Affiliation:
imec, Leuven, Belgium. IKS, KU Leuven, Leuven, Belgium.
Richard Morris
Affiliation:
imec, Leuven, Belgium.
Davit Melkonyan
Affiliation:
imec, Leuven, Belgium. IKS, KU Leuven, Leuven, Belgium.
Jonathan Op de Beeck
Affiliation:
imec, Leuven, Belgium. IKS, KU Leuven, Leuven, Belgium.
Igor Makhotkin
Affiliation:
imec, Leuven, Belgium. IKS, KU Leuven, Leuven, Belgium.
Paul van der Heide
Affiliation:
imec, Leuven, Belgium.
Wilfried Vandervorst
Affiliation:
imec, Leuven, Belgium. IKS, KU Leuven, Leuven, Belgium.
*
*Corresponding author: Claudia.Fleischmann@imec.be

Abstract

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Type
Recent Developments in Atom Probe Tomography
Information
Microscopy and Microanalysis , Volume 25 , Supplement S2 , August 2019 , pp. 312 - 313
Copyright
Copyright © Microscopy Society of America 2019 

References

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