Hostname: page-component-76fb5796d-25wd4 Total loading time: 0 Render date: 2024-04-25T15:55:38.526Z Has data issue: false hasContentIssue false

Micro-to-nano Scale Strain Characterization of 2024 Aluminum-alloys with Incoherent/Coherent Precipitates

Published online by Cambridge University Press:  30 July 2020

Florent Ravaux
Affiliation:
Khalifa University, Abu Dhabi, Abu Dhabi, United Arab Emirates
Dalaver Anjum
Affiliation:
Khalifa University, Abu Dhabi, Abu Dhabi, United Arab Emirates
Cyril Aubry
Affiliation:
Khalifa University, Abu Dhabi, Abu Dhabi, United Arab Emirates
Gregory Haidemenopoulos
Affiliation:
University of Thessaly, Volos, Magnisia, Greece
Helen Kamoutsi
Affiliation:
University of Thessaly, Volos, Magnisia, Greece
H. Mavros
Affiliation:
Khalifa University, Abu Dhabi, Abu Dhabi, United Arab Emirates
Nirpendra Singh
Affiliation:
Khalifa University, Abu Dhabi, Abu Dhabi, United Arab Emirates
Issam Qattan
Affiliation:
Khalifa University, Abu Dhabi, Abu Dhabi, United Arab Emirates
Gobind Das
Affiliation:
Khalifa University, Abu Dhabi, Abu Dhabi, United Arab Emirates
Shashikant Patole
Affiliation:
Khalifa University, Abu Dhabi, Abu Dhabi, United Arab Emirates

Abstract

Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Crystallography at the Nanoscale and MicroED with Electrons and X-rays
Copyright
Copyright © Microscopy Society of America 2020

References

Ozdol, V. B., Tyutyunnikov, D., Koch, C.T., and van Aken, P. A., “Strain mapping for advanced CMOS technologies” Cryst. Res. Technol.49 (1), (2014) pp. 3842 doi.org/10.1002/crat.201300226CrossRefGoogle Scholar
Hytch, M., Snoeck, F., Kilaas, R., “Quantitative measurement of displacement and strain fields from HREM micrographs”, Ultramicroscopy 74 (1998), pp. 131146 doi.org/10.1016/S0304-3991(98)00035-7CrossRefGoogle Scholar
Rouviere, J.-L., Haas, B., Robin, E., Cooper, D., N. Bernier and M. Williamson, “The Measurement of Strain, Chemistry and Electric Fields by STEM based Techniques”, Microsc. Microanal. 23 (S1), (2017). doi.org/10.1017/S1431927617007735CrossRefGoogle Scholar
Williamson, M. J., van Dooren, P., and Flanagan, J., “Quantitative analysis of the accuracy and sensitivity of strain measurements from nanobeam electron diffraction”, 2015 IEEE 22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits, (2015), pp.197–200 doi.org/10.1109/IPFA.2015.7224366Google Scholar