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Micro-Raman Characterization of Phase Formation and Thermal Stability of Nickel Silicide Thin Films.

Published online by Cambridge University Press:  01 August 2005

G Conti ,
C Lazik  and
Y Uritsky
G Conti
Affiliation:
Applied Materials Inc., Santa Clara, California
C Lazik
Affiliation:
Applied Materials Inc., Santa Clara, California
Y Uritsky
Affiliation:
Applied Materials Inc., Santa Clara, California

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2005 in Honolulu, Hawaii, USA, July 31--August 4, 2005

Type
Research Article
Information
Microscopy and Microanalysis , Volume 11 , Issue S02 , August 2005 , pp. 2094 - 2095
Copyright
© 2005 Microscopy Society of America