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Micromachining of Si 3 N 4 by Ga + -Ion Implantation and Dry Etching

  • Margarita Baluktsian (a1), Kahraman Keskinbora (a1), Umut T. Sanli (a1) and Gisela Schütz (a1)
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Abstract

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References

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[1] Keskinbora, K., et al., Acs Nano 7 (2013) 97889797.
[2] Keskinbora, K., et al., Adv Opt Mater 3 (2015) 792800.
[3] Schmidt, B., et al., J Electrochem Soc 152 (2005) G875G879.
[4] Henry, M.D., et al., Nanotechnology 21 (2010).
[5] Waid, S., et al., Nanotechnology 25 (2014).
[6] Erdmanis, M. & Tittonen, I. Appl Phys Lett 104 (2014).
[7] Li, W.D., et al., J Vac Sci Technol B 30 (2012).

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