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High Resolution TEM of Post-Deposition Ion Implanted C-BN Films

Published online by Cambridge University Press:  02 July 2020

T. Dolukhanyan ,
S. Gunasekara ,
E. Byon ,
S.W. Lee ,
S.R. Lee  and
C. Sung
T. Dolukhanyan
Affiliation:
Department of Chemical and Nuclear Engineering, Center for Advanced Materials, University of Massachusetts Lowell, Lowell, MA01854
S. Gunasekara
Affiliation:
Department of Chemical and Nuclear Engineering, Center for Advanced Materials, University of Massachusetts Lowell, Lowell, MA01854
E. Byon
Affiliation:
Korea Institute of Metal and Machinery, Changwon, Korea
S.W. Lee
Affiliation:
Korea Institute of Metal and Machinery, Changwon, Korea
S.R. Lee
Affiliation:
Korea Institute of Metal and Machinery, Changwon, Korea
C. Sung
Affiliation:
Department of Chemical and Nuclear Engineering, Center for Advanced Materials, University of Massachusetts Lowell, Lowell, MA01854
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Extract

Post-deposition ion implantation of boron nitride (BN) films is to be considered as a powerful method for improvement of adhesion between films and substrates and reduction of compressive stresses, which usually accompany the growth of cubic BN.

The goal of this investigation is microcharacterization of as-deposited and ion-implanted BN films to better understand effect of ion implantation on microstructure of the films and film/substrate interface. High Resolution TEM (HF-2000 with field emission gun) has been utilized because of nanocrystalline dimensions of both cubic (c-) and hexagonal (h-) BN phases.

BN films have been deposited on (100) oriented Si substrates by magnetically enhanced activated reactive evaporation2. Plasma source ion implantation has been performed to make surface modifications and to improve the adhesion of the films. X/S specimens for TEM and HRTEM have been prepared in a routine manner, using G-1 epoxy for coupling the specimens, Dimpler VCR D500I, and Gatan Precision Ion Polishing System for final thinning.

Type
Thin Films/Coatings
Information
Microscopy and Microanalysis , Volume 5 , Issue S2: Proceedings: Microscopy & Microanalysis '99, Microscopy Society of America 57th Annual Meeting, Microbeam Analysis Society 33rd Annual Meeting, Portland, Oregon August 1-5, 1999 , August 1999 , pp. 830 - 831
Copyright
Copyright © Microscopy Society of America

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References

1.Sung, C.et al., Proc. 55th Ann. MSA Meeting (1998) 566Google Scholar
2.Inagava, K.et al., Surface and Coating Technology, 39/40 (1989) 116Google Scholar
3.Conrad, J.R.et al., J. Appl. Phys. 62, 11 (1987) 4591CrossRefGoogle Scholar