Hostname: page-component-848d4c4894-nmvwc Total loading time: 0 Render date: 2024-06-23T19:04:55.855Z Has data issue: false hasContentIssue false
  • English
  • Français

Electron Irradiation Cleaning of the SEM and its Samples

Published online by Cambridge University Press:  30 July 2021

Andras Vladar ,
David Hoyle  and
Hosoya Kotaro
Andras Vladar
Affiliation:
Natl. Inst. of Standards and Technology, Gaithersburg, Maryland, United States
David Hoyle
Affiliation:
Self employed, n/a, Canada
Hosoya Kotaro
Affiliation:
Hitachi HTA, United States

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Advances in Focused Ion Beam Instrumentation, Applications and Techniques in and Materials and Life Sciences
Information
Microscopy and Microanalysis , Volume 27 , Supplement S1 , August 2021 , pp. 434 - 435
Copyright
Copyright © The Author(s), 2021. Published by Cambridge University Press on behalf of the Microscopy Society of America

References

Active monitoring and control of electron-beam-induced contamination, 2001, Vladár, A. E., et al. https://doi.org/10.1117/12.436724CrossRefGoogle Scholar
The Scanning Electron Microscope Contamination Assessment Reference Sample (SEMCARS) is available for free through a cooperation with NIST, contact the author at Google Scholar
Sparkle EC of Hitachi High-Technologies Canada, Inc. https://www.hitachi-hightech.com/ca/Google Scholar
Contamination Mitigation Strategy for Ultra-Low Energy Electron Microscopy and Spectroscopy, 2019, Mikmeková, E. M. et al. https://doi.org/10.1017/S1431927619003234Google Scholar
Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces, 2018, Gurbán, S., et al. https://doi.org/10.1038/s41598-018-20537-4Google Scholar