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Detection of Characteristic Signals from As-Doped (less than 1 at.%) Regions of Silicon by Transmission Electron Microscopy and Convergent-beam Electron Diffraction

  • Masami Terauchi (a1), Kenji Tsuda (a1), Hajime Mitsuishi (a1) and Kazuo Kawamura (a2)

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Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

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Detection of Characteristic Signals from As-Doped (less than 1 at.%) Regions of Silicon by Transmission Electron Microscopy and Convergent-beam Electron Diffraction

  • Masami Terauchi (a1), Kenji Tsuda (a1), Hajime Mitsuishi (a1) and Kazuo Kawamura (a2)

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