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Atomic-Scale Mechanisms for Interfacial Radiation Damage Resistance of Thin Film Oxide Heterostructures

Published online by Cambridge University Press:  05 August 2019

Steven R. Spurgeon ,
Michel Sassi ,
Tiffany Kaspar ,
Weilin Jiang  and
Vaithiyalingam Shutthanandan
Steven R. Spurgeon
Affiliation:
Energy and Environment Directorate, Pacific Northwest National Laboratory, Richland, USA
Michel Sassi
Affiliation:
Physical and Computational Sciences Directorate, Pacific Northwest National Laboratory, Richland, USA
Tiffany Kaspar
Affiliation:
Physical and Computational Sciences Directorate, Pacific Northwest National Laboratory, Richland, USA
Weilin Jiang
Affiliation:
Energy and Environment Directorate, Pacific Northwest National Laboratory, Richland, USA
Vaithiyalingam Shutthanandan
Affiliation:
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, USA

Abstract

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Type
Microscopy and Microanalysis of Nuclear and Irradiated Materials
Information
Microscopy and Microanalysis , Volume 25 , Supplement S2 , August 2019 , pp. 1562 - 1563
Copyright
Copyright © Microscopy Society of America 2019 

References

[1]Spurgeon, S. R. et al. Polarization screening-induced magnetic phase gradients at complex oxide interfaces. Nat. Commun. 6, 6735 (2015).Google Scholar
[2]Spurgeon, S. R. & Chambers, S. A. Atomic-Scale Characterization of Oxide Interfaces and Superlattices Using Scanning Transmission Electron Microscopy. in Reference Module in Chemistry, Molecular Sciences and Chemical Engineering 1–11 (Elsevier, 2017).Google Scholar
[3]Sassi, M., Kaspar, T., Rosso, K. M. & Spurgeon, S. R. Effect of structure and composition on the electronic excitation induced amorphization of La2Ti2−xZrxO7 ceramics. (2018). Arxiv: 1812.01136Google Scholar