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Analysis of Nano-scale Strain Near Shallow Trench Isolation Structures by Energy-filtered Convergent Beam Electron Diffraction

Published online by Cambridge University Press:  31 July 2006

P Zhang ,
J Mardinly ,
O Karpenko ,
A Istratov ,
H He ,
J Ager ,
C Nelson ,
E Stach ,
C Kisielowski  and
E Weber
...Show all authors
P Zhang
Affiliation:
Lawrence Berkeley National Laboratory Lawrence Berkeley National Laboratory Intel Corporation
J Mardinly
Affiliation:
Intel Corporation
O Karpenko
Affiliation:
Intel Corporation
A Istratov
Affiliation:
Lawrence Berkeley National Laboratory Lawrence Berkeley National Laboratory
H He
Affiliation:
Lawrence Berkeley National Laboratory
J Ager
Affiliation:
Lawrence Berkeley National Laboratory
C Nelson
Affiliation:
Lawrence Berkeley National Laboratory
E Stach
Affiliation:
Purdue University
C Kisielowski
Affiliation:
Lawrence Berkeley National Laboratory
E Weber
Affiliation:
Lawrence Berkeley National Laboratory Lawrence Berkeley National Laboratory
J Spence
Affiliation:
Lawrence Berkeley National Laboratory

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Extended abstract of a paper presented at Microscopy and Microanalysis 2006 in Chicago, Illinois, USA, July 30 – August 3, 2006

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Abstract
Information
Microscopy and Microanalysis , Volume 12 , Issue S02 , August 2006 , pp. 938 - 939
Copyright
© 2006 Microscopy Society of America