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Helium Ion Microscopy, Principles and Applications, David C. Joy. Springer, New York, 2013, 64 pages. ISBN 978-1-4614-8659-6.

Published online by Cambridge University Press:  24 February 2014

Michael T. Postek*
Affiliation:
Semiconductor and Dimensional Metrology DivisionPhysical Measurement LaboratoryNational Institute of Standards and TechnologyGaithersburg, MD
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Abstract

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Type
Book Review
Copyright
© Microscopy Society of America 2014 

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