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Development of an X-ray photoelectron microscopic system with a compact X-ray source

  • CHIEMI FUJIKAWA (a1) (a2), NAOHIRO YAMAGUCHI (a1), TADAYUKI OHCHI (a3), TAMIO HARA (a1), KATSUMI WATANABE (a4), IBUKI TANAKA (a4) and MASAMI TAGUCHI (a4)...

Abstract

We have constructed an X-ray photoelectron microscopic system. An X-ray source is a laser-produced plasma in a scheme of an X-ray laser experiment. X rays involving amplified spontaneous emissions (ASE) at 15.47 nm were delivered with a 10-Hz repetition rate from a compact X-ray laser system. X rays were collected and focused by a Schwarzschild optics coated with Mo/Si multilayers for a 15.47-nm X ray. Photoelectron signals due to the Ga 3d and As 3d electrons were observed, when a GaAs wafer was used as a sample. The spatial resolution of about 1 μm was confirmed.

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Corresponding author

Address correspondence and reprint requests to: Chiemi Fujikawa, Department of Photo-Optical Engineering, Tokyo Institute of Polytechnics, 1583 Iiyama, Atsugi 243-0297, Japan. E-mail: chiemi@photo.t-kougei.ac.jp

Keywords

Development of an X-ray photoelectron microscopic system with a compact X-ray source

  • CHIEMI FUJIKAWA (a1) (a2), NAOHIRO YAMAGUCHI (a1), TADAYUKI OHCHI (a3), TAMIO HARA (a1), KATSUMI WATANABE (a4), IBUKI TANAKA (a4) and MASAMI TAGUCHI (a4)...

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