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Nano-structured lithium-tin plane fabrication for laser produced plasma and extreme ultraviolet generation

Published online by Cambridge University Press:  08 August 2008

Keiji Nagai
Affiliation:
Institute of Laser Engineering, Osaka University, Osaka, Japan
Q. Gu
Affiliation:
Institute of Laser Engineering, Osaka University, Osaka, Japan
T. Norimatsu
Affiliation:
Institute of Laser Engineering, Osaka University, Osaka, Japan
S. Fujioka
Affiliation:
Institute of Laser Engineering, Osaka University, Osaka, Japan
H. Nishimura
Affiliation:
Institute of Laser Engineering, Osaka University, Osaka, Japan
N. Miyanaga
Affiliation:
Institute of Laser Engineering, Osaka University, Osaka, Japan
K. Nishihara
Affiliation:
Institute of Laser Engineering, Osaka University, Osaka, Japan
Y. Izawa
Affiliation:
Institute of Laser Engineering, Osaka University, Osaka, Japan
K. Mima
Affiliation:
Institute of Laser Engineering, Osaka University, Osaka, Japan
Corresponding
E-mail address:

Abstract

This paper deals with a lithium/tin combined target to increase the conversion efficiency of extreme ultraviolet (EUV) of 13.5 nm emission from laser-produced plasma. The bilayer target of glass/lithium (20 nm)/tin (50 nm) exhibits a sharp and strong emission in comparison with a Sn bulk target. The reverse coating of glass/tin/lithium was unstable and EUV could not be observed. By using nano-porous SnO2 and an electrochemical deposition of lithium, nano-structured lithium/tin composite was prepared, and was stable without deliquescence of lithium.

Type
Research Article
Copyright
Copyright © Cambridge University Press 2008

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