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A Method Integrating Optimal Algorithm and FEM on CMOS Residual Stress

  • W. C. Chuang (a1), David T. W. Lin (a2), Y.-C. Hu (a3), H.-L. Lee (a4), C.-H. Cheng (a5), P.-Z. Chang (a6) and N. B. Quyen (a7)...


Residual stress in MEMS is of inherent importance in various respects. This study proposes a specific method using ANSYS including the birth and death method and combined with the optimal method (SCGM) to reduce the residual stresses during the CMOS fabrication process. The suitable cooling temperature for decreasing the residual stress is proposed and available. It demonstrates that the suitable parameter on the fabrication can reduce the residual stress in MEMS devices without any extra manufacturing process or external apparatus. The proposed method can expand to simulate the realistic MEMS model effectively.


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