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Suppression of pyrochlore phase formation in Sr0.7Bi2.4Ta2O9 thin films using nanoseed layer

  • Se-Yeon Jung (a1), Seung-Joon Hwang (a1) and Yun-Mo Sung (a1)

Abstract

A Sr0.7Bi2.4Ta2O9 (SBT) seed layer approximately 40 nm thick was formed on Pt/Ti/SiO2/Si substrates, and SBT thin films with the same chemical composition were deposited on the substrates with and without seed layer using sol-gel and spin coating methods. The influence of seed layer on the phase formation characteristics of SBT thin films was investigated using x-ray diffraction and scanning electron microscopy analyses. Formation of pyrochlore as well as Aurivillius phase was observed in both the unseeded and seeded SBT films heated at 740 °C. However, it was revealed that Aurivillius phase formation was enhanced in seeded SBT thin films and pyrochlore phase formation was highly suppressed. In this study, two possible mechanisms for the suppression of pyrochlore phase formation were proposed from the perspectives of activation energy difference between Aurivillius and pyrochlore phase formation, and Bi-ion diffusion to pyrochlore phase.

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