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Reactions between palladium and gallium arsenide: Bulk versus thin-film studies

Published online by Cambridge University Press:  31 January 2011

J. -C. Lin ,
K. -C. Hsieh ,
K. J. Schulz  and
Y. A. Chang
J. -C. Lin
Affiliation:
Department of Metallurgical and Mineral Engineering, University of Wisconsin, 1509 University Avenue, Madison, Wisconsin 53706
K. -C. Hsieh
Affiliation:
Department of Metallurgical and Mineral Engineering, University of Wisconsin, 1509 University Avenue, Madison, Wisconsin 53706
K. J. Schulz
Affiliation:
Department of Metallurgical and Mineral Engineering, University of Wisconsin, 1509 University Avenue, Madison, Wisconsin 53706
Y. A. Chang
Affiliation:
Department of Metallurgical and Mineral Engineering, University of Wisconsin, 1509 University Avenue, Madison, Wisconsin 53706
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Abstract

Reactions between Pd and GaAs have been studied using bulk-diffusion couples of Pd (∼0.6 mm thick) /GaAs and thin-film Pd (50 and 160 nm)/GaAs samples. The sequence of phase formation at 600°C between bulk Pd and GaAs was established. Initial formation of the solution phase μ and the ternary phase T does not represent the stable configuration. The stable configuration is GaAs |∊|Λ|γ|ν|Pd and is termed the diffusion path between GaAs and Pd. The sequence of phase formation for the bulk-diffusion couples is similar at 500°C. Phase formation for the thin-film Pd/GaAs specimens was studied at 180,220,250,300,350,400,450,600, and 1000°C for various annealing times. The sequence of phase formation obtained from the thin-film experiments is rationalized readily from the known ternary phase equilibria of Ga–Pd–As and the results from the bulk-diffusion couples of Pd/GaAs. The thin-film results reported in the literature are likewise rationalized. The diffusion path concept provides a useful guide in understanding the phase formation in Pd–GaAs interface or any other M-GaAs interface. This information is important in designing a uniform, stable contact for the metallization of GaAs.

Type
Articles
Information
Journal of Materials Research , Volume 3 , Issue 1 , February 1988 , pp. 148 - 163
Copyright
Copyright © Materials Research Society 1988

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References

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