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Photocatalytic activity enhancement of TiO2 porous thin film due to homogeneous surface modification of RuO2

Published online by Cambridge University Press:  16 June 2011

Peng Liu ,
Weiying Li ,
Jingbo Zhang  and
Yuan Lin
Peng Liu
Affiliation:
State Key Laboratory of Pollution Control and Resource Reuse, Tongji University, Shanghai 200092, People’s Republic of China
Weiying Li*
Affiliation:
State Key Laboratory of Pollution Control and Resource Reuse, Tongji University, Shanghai 200092, People’s Republic of China
Jingbo Zhang*
Affiliation:
Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100080, People’s Republic of China
Yuan Lin
Affiliation:
Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100080, People’s Republic of China
*
a)Address all correspondence to these authors. e-mail: liweiying@tongji.edu.cn
a)Address all correspondence to these authors. e-mail: liweiying@tongji.edu.cn
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Abstract

Ruthenium dioxide (RuO2) was uniformly modified on TiO2 porous thin film by impregnation of Ru-contained dye on the film followed by sintering it at 450 °C to burn off organic matters and form ruthenium oxide, which is named as impregnation method. The homogenous modification of metal oxide inside porous thin film can be realized by the impregnation method, and the modification amount of RuO2 can be easily adjusted by the iteration numbers of impregnation and sintering. Appropriate amount of uniformly modified RuO2 was found to obviously enhance photocatalytic performance of TiO2 to degrade eosin Y. The photocatalysis enhancement was attributed to the shallow hole traps on the surface of nanoparticles formed by RuO2, and these traps can retard recombination of hole with electron.

Keywords

RuAdsorptionCatalytic
Type
Articles
Information
Journal of Materials Research , Volume 26 , Issue 12 , 28 June 2011 , pp. 1532 - 1538
Copyright
Copyright © Materials Research Society 2011

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