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Nanoscale flow deformation of silicate glass ultrathin films for development of nano-patterned glass surfaces

Published online by Cambridge University Press:  03 March 2011

Shusaku Akiba
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
Wakana Hara
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
Shuhei Sato
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
Akifumi Matsuda
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
Atsushi Sasaki
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
Mamoru Yoshimoto*
Affiliation:
Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
*
a)Address all correspondence to this author. e-mail: m.yoshimoto@msl.titech.ac.jp
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Abstract

The nanoscale behavior of high-temperature flow deformation for silicate-based oxide glass ultrathin films was characterized with focus on forming a nano-patterned glass surface. The oxide glass thin films were deposited at room temperature by pulsed laser deposition onto the ultrasmooth sapphire substrates with 0.2-nm-high atomic steps. It was found from atomic force microscopy (AFM) measurements that the silicate ultrathin films (about 3 nm thick) started to deform at a temperature 50 °C lower than the glass transition point of the bulk glass. The glass thin films annealed at high temperatures exhibited the nano-stepped surface structure reflecting the sapphire substrate surface. By scanning the AFM tip on the as-deposited glass film in a contact mode and then thermal annealing the film, we could pattern the nano-stepped glass surface at a nanoscale.

Type
Articles
Copyright
Copyright © Materials Research Society 2004

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