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Microstructure and Chemistry of Annealed Al–Cu–Fe–Cr Quasicrystalline Approximant Coatings

Published online by Cambridge University Press:  03 March 2011

M.J. Daniels*
Affiliation:
Center for Nanomaterials Science, Department of Materials Science and Engineering,University of Michigan, Ann Arbor, Michigan 48109-2136
J.S. Zabinski
Affiliation:
Air Force Research Laboratory, Wright-Patterson Air Force Base, Dayton, Ohio 45433
H. Wu
Affiliation:
School of Engineering, Coventry University, Coventry CV1 5FB, United Kingdom
C.R.M. Grovenor
Affiliation:
Department of Materials, University of Oxford, Oxford OX1 3PH, United Kingdom
J.C. Bilello
Affiliation:
Center for Nanomaterials Science, Department of Materials Science and Engineering,University of Michigan, Ann Arbor, Michigan 48109-2136
*
a)Address all correspondence to this author. e-mail: mdaniels@umich.edu
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Abstract

An as-deposited Al–Cu–Fe–Cr film was annealed in flowing argon to study development of a quasicrystalline approximant microstructure. Sputter profile x-ray photoemission spectroscopy analysis showed oxygen incorporation reached approximately 70 at.% at the surface of the film, declined monotonically, and stabilized at ∼10 at.% at a depth of 160 nm. Synchrotron grazing incidence x-ray scattering was used to probe the structure of the coating at various penetration depths by altering the angle of the incident x-ray beam. An amorphous structure was observed near the termination surface, which coexisted with a compressively strained crystalline aluminum. These phases were the dominant microstructure to a depth of 110 nm. Below 150 nm, the film was primarily O1 decagonal approximant. Cross-section transmission electron microscopy elucidated a columnar growth morphology with associated porosity in the interstices between the columns. The resulting development of the Al–Cu–Fe–Cr decagonal approximant coatings from the precursor is reported.

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Articles
Copyright
Copyright © Materials Research Society 2004

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