Skip to main content Accessibility help
×
Home

Micromachining of mesoporous oxide films for microelectromechanical system structures

  • Jong-Ah Paik (a1), Shih-Kang Fan (a2), Chang-Jin Kim (a2), Ming C. Wu (a3) and Bruce Dunn (a1)...

Abstract

The high porosity and uniform pore size of mesoporous oxide films offer unique opportunities for microelectromechanical system (MEMS) devices that require low density and low thermal conductivity. This paper provides the first report in which mesoporous films were adapted for MEMS applications. Mesoporous SiO2 and Al2O3 films were prepared by spin coating using block copolymers as the structure-directing agents. The resulting films were over 50% porous with uniform pores of 8-nm average diameter and an extremely smooth surface. The photopatterning and etching characteristics of the mesoporous films were investigated and processing protocols were established which enabled the films to serve as the sacrificial layer or the structure layer in MEMS devices. The unique mesoporous morphology leads to novel behavior including extremely high etching rates and the ability to etch underlying layers. Surface micromachining methods were used to fabricate three basic MEMS structures, microbridges, cantilevers, and membranes, from the mesoporous oxides.

Copyright

Corresponding author

a)Address all correspondence to this author.

References

Hide All
1.Raman, N.K., Anderson, M.T., and Brinker, C.J., Chem. Mater. 8, 1682 (1996).
2.Zhao, D., Yang, P., Huo, Q., Chmelka, B.F., and Stucky, G.D., Curr. Opin. Solid State Mater. Sci. 3, 111 (1998).
3.A. Van Blaaderen, Ruel, R., and Wiltzius, P., Nature 385, 321 (1997).
4.Kresge, C.T., Leonowicz, M.E., Roth, W.J., Vartuli, J.C., and Beck, J.S., Nature 359, 710 (1992).
5.Yang, P., Zhao, D., Margolese, D.I., Chmelka, B.F., and Stucky, G.D., Chem. Mater. 11, 2813 (1999).
6.Yang, H., Ozin, G.A., and Kresge, C.T., Adv. Mater. 10, 883 (1998).
7.Zhao, D., Yang, P., Melosh, N., Feng, J., Chmelka, B.F., and Stucky, G.D., Adv. Mater. 10, 1380 (1998).
8.Lu, Y., Ganguli, R., Drewien, E.A., Anderson, M.T., Brinker, C.J., Gong, W., Guo, Y., Soyez, H., Dunn, B., Huang, M.H., and Zink, J.I., Nature 389, 364 (1997).
9.Zhao, D., Huo, Q., Feng, J., Chmelka, B.F., and Stucky, G.D., J. Am. Chem. Soc. 120, 6042 (1998).
10.Yang, P., Deng, T., Zhao, D., Feng, P., Pine, D., Chmelka, B.F., Whitesides, G.M., and Stucky, G.D., Science 282, 2244 (1998).
11.Yang, P., Wirnsberger, G., Huang, H.C., Cordero, S.R., McGehee, M.D., Scott, B., Deng, T., Whitesides, G.M., Chmelka, B.F., Buratto, S.K., and Stucky, G.D., Science 287, 465 (2000).
12.Hayward, R.C., Alberius-Henning, P., Chmelka, B.F., and Stucky, G.D., Microporous Mesoporous Mater. 44– 45, 619 (2001).
13.See the special issue of MRS Bull. April 2001: Microelectromechanical Systems: Technology and Applications guest edited by Bishop, D., Heuer, A. and Williams, D., p. 282.
14.(a) Besson, S., Gacoin, T., Jacquiod, C., Ricolleau, C., Babonneau, D., and Boilot, J-P., J. Mater. Chem. 10, 1331 (2000); (b) S. Besson, C. Ricolleau, T. Gacoin, C. Jacquiod, and J-P. Boilot, J. Phys. Chem. B 104, 12095 (2000).
15.Suh, D.J. and Park, T-J., Chem. Mater. 9, 1903 (1997).
16.Chu, B. and Zhou, Z., in Nonionic Surfactants: polyoxyalkylene block copolymers edited by Nace, V.M. (Marcel Dekker, New York, 1996), p. 67.
17.Born, M. and Wolf, E., Principles of Optics (Pergamon Press, Oxford, U.K., 1986).
18.Mitschke, F., Opt. Lett. 14, 967 (1989).
19.Matsuoka, J., Kitamura, N., Fujinaga, S., Kitaoka, T., and Yamashita, H., J. Non-Cryst. Solids 135, 86 (1991).
20.Clark, N., MRS Bull. 26, 320 (2001).
21.Joe, I.H., Vasudevan, A.K., Aruldhas, G., Damodaran, A.D., and Warrier, K.G.K., J. Solid State Chem. 131, 181 (1997).
22.Guo, C., Liu, H.Z., and Chen, J.Y., Colloid Polym. Sci. 277, 376 (1999).
23.Bertoluzza, A., Fagnano, C., Morelli, M.A., Gottardi, V., and Guglielmi, M., J. Non-Cryst. Solids 48, 117 (1982).
24.Ozer, N., Cronin, J.P., Yao, Y.J., and Tomsia, A.P., Sol. Energy Mater. Sol. Cells 59, 355 (1999).
25.Silvestri, V.J., Osburn, C.M., and Ormond, D.W., J. Electrochem. Soc. 125, 902 (1978).
26.Yasuyuki, T. and Tadashi, S.M., J. Vac. Sci. Technol., A 16, 2042 (1998).
27.Madou, M.J., Fundamentals of Microfabrication (CRC Press, New York, 1997).
28.Williams, K.R. and Muller, R.S., J. Microelectromech. Syst. 5, 256 (1996).
29.Senturia, S.D., Microsystem Design (Kluwer Academic Publishers, Boston, MA, 2000).

Related content

Powered by UNSILO

Micromachining of mesoporous oxide films for microelectromechanical system structures

  • Jong-Ah Paik (a1), Shih-Kang Fan (a2), Chang-Jin Kim (a2), Ming C. Wu (a3) and Bruce Dunn (a1)...

Metrics

Altmetric attention score

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed.