Hostname: page-component-8448b6f56d-t5pn6 Total loading time: 0 Render date: 2024-04-23T21:31:15.835Z Has data issue: false hasContentIssue false
  • English
  • Français

Microcharacterization of liquid delivery metalorganic chemical vapor deposition processed thin film materials exhibiting giant magnetoresistance

Published online by Cambridge University Press:  31 January 2011

M. L. Weaver ,
L. P. M. Brandao ,
H. Garmestani ,
E. S. Gillman ,
K. H. Dahmen  and
A. Morrone
M. L. Weaver
Affiliation:
Department of Mechanical Engineering, FAMU-FSU College of Engineering, Tallahassee, Florida 32310–2175
L. P. M. Brandao
Affiliation:
Department of Mechanical Engineering, FAMU-FSU College of Engineering, Tallahassee, Florida 32310–2175
H. Garmestani
Affiliation:
Department of Mechanical Engineering, FAMU-FSU College of Engineering, Tallahassee, Florida 32310–2175
E. S. Gillman
Affiliation:
Department of Chemistry and MARTECH, Florida State University, Tallahassee, Florida 32306–3006
K. H. Dahmen
Affiliation:
Department of Chemistry and MARTECH, Florida State University, Tallahassee, Florida 32306–3006
A. Morrone
Affiliation:
Major Analytical Instrumentation Center, Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611–2066
Get access

Abstract

Thin films of La0.6Ca0.4MnO3 (LCMO) have been produced on (001) oriented LaAlO3 (LAO) and yttrium-stabilized zirconia (YSZ) substrates by liquid-delivery metalorganic chemical vapor deposition (LD-MOCVD). X-ray diffraction (XRD) analyses showed that the films were epitaxially grown on LAO substrates and were monocrystalline at a thickness of less than 500 Å. At a thickness of greater than 500 Å, the films became polycrystalline but maintained their high texture (preferred crystalline orientation). Films grown on YSZ were always polycrystalline but were also highly oriented. Regardless of the substrate, the 1500 Å thick polycrystalline films exhibited substantially significant magnetoresistance ratios even above room temperature.

Type
Articles
Information
Journal of Materials Research , Volume 14 , Issue 5 , May 1999 , pp. 2007 - 2011
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Jin, S., Tiefel, T. H., McCormack, M., Fastnacht, R.A., Ramesh, R., and Chen, L. H., Science 264, 413–415 (1994).CrossRefGoogle Scholar
2.Chen, C.H. and Cheong, S. W., Phys. Rev. Lett. 76, 4042 (1996).CrossRefGoogle Scholar
3.von Helmholt, R., Wecker, J., Holzapfel, B., Schultz, L., and Samwer, K., Phys. Rev. Lett. 71, 2231–2334 (1993).Google Scholar
4.Snyder, G. J., Hiskes, R., DiCarolis, S., Beasley, M. R., and Geballe, T. H., Phys. Rev. B 53, 14434–14444 (1996).CrossRefGoogle Scholar
5.Hwang, H.Y., Cheong, S.W., Radaelli, P. G., Marezio, M., and Batlogg, B., Phys. Rev. Lett. 75, 914–917 (1995).CrossRefGoogle Scholar
6.van Santen, H. and Jonker, G.H., Physica 16, 599 (1950).CrossRefGoogle Scholar
7.van Santen, H. and Jonker, G.H., Physica 16, 337 (1950).CrossRefGoogle Scholar
8.Wollan, E.O. and Koehler, W. C., Phys. Rev. 100, 545 (1955).CrossRefGoogle Scholar
9.Kwak, B.S., Phys. Rev. Lett. 68 (25), 3733 (1992).CrossRefGoogle Scholar
10.Gillman, E.S., Carris, M., Smith, C., and Dahmen, K.H., in Chemical Vapor Deposition—Proceedings of the Fourteenth International Conference and EUROCVD-11, edited by Allendorf, M.D. and Bernard, C. (The Electrochemical Society, Pennington, NJ, 1997), p. 1506.Google Scholar
11.Dahmen, K-H. and Carris, M. W., Chem. Vapor Deposition (Adv. Mater.) 3, 27–30 (1997).CrossRefGoogle Scholar
12.Dahmen, K.H. and Carris, M.W., J. Alloys and Compd. 251, 270–277 (1997).CrossRefGoogle Scholar
13.Heremans, J. J., Carris, M., Watts, S., Yu, X., Dahmen, K. H., and VonMolnar, S., J. Appl. Phys. 81 (1997).Google Scholar
14.Schultz, L. G., J. Appl. Phys. 20, 1030 (1949).CrossRefGoogle Scholar
15.Kallend, J., Kocks, U.F., Rollett, A. D., and Wenk, H-R., Mater. Sci. Eng. A132, 1–11 (1991).CrossRefGoogle Scholar
16.Gillman, E.S., Li, M., and Dahmen, K-H., J. Appl. Phys., in press.Google Scholar