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Ion beam assisted deposition of textured magnesium oxide templates on un-buffered glass and silicon substrates

Published online by Cambridge University Press:  01 January 2006

Ronald N. Vallejo  and
Judy Z. Wu
Ronald N. Vallejo
Affiliation:
Department of Physics and Astronomy, The University of Kansas, Lawrence, Kansas 66045
Judy Z. Wu*
Affiliation:
Department of Physics and Astronomy, The University of Kansas, Lawrence, Kansas 66045
*
a)Address all correspondence to this author. e-mail: jwu@ku.edu
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Abstract

Biaxially textured magnesium oxide (MgO) templates of 10-nm thickness were successfully fabricated on glass and silicon substrates without any buffer layers using Ar+ ion beam assisted e-beam evaporation. With an additional layer of 100 nm homoepi MgO on top, the in-plane misorientation of ∼6.5° and out-of-plane misorientation of ∼2.0° have been obtained. Prior to growth, the substrates were bombarded with the same Ar+ ion beam for a certain period ranging from 5 to 35 min to provide initial substrate conditions for textured MgO formation. The ion beam induced modification of the substrate surface morphology was characterized using atomic force microscopy. Reduced surface roughness Ra from 2 to 3 nm on the original glass substrates to below 1.0 nm after 5 min ion beam bombardment was found to be an important condition for the textured MgO formation. The nearly unchanged Ra ≤ 1 nm of the silicon substrate after the ion beam bombardment, however, suggests that additional surface modification is required for the textured MgO to form.

Keywords

Ion beam assisted depositionFilmTexture
Type
Articles
Information
Journal of Materials Research , Volume 21 , Issue 1 , January 2006 , pp. 194 - 198
Copyright
Copyright © Materials Research Society 2006

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References

REFERENCES

1.Roeder, J.R., Chen, I.S., Van Buskirk, P.C., Beratan, H.R., and Hanson, C.M.: Dielectric and pyroelectric properties of thin film PZT, in Proceedings of the Eleventh IEEE International Symposium on Applications of Ferroelectrics, edited by Colla, E., Damjanovic, D., and Setter, N. (ISAF Cat. No. 98CH36245, Montreaux, Switzerland, 1998), p. 217.Google Scholar
2.Yang, C.C., Chen, M.S., Hong, T.J., Wu, C.M., Wu, J.M. and Wu, T.B.: Preparation of (100)-oriented metallic LaNiO3 thin films on Si substrates by radio frequency magnetron sputtering for the growth of textured Pb(Zr0.53Ti0.47)O3. Appl. Phys. Lett. 66, 2643 (1995).Google Scholar
3.Es-Souni, M., Kuhnke, M., Iakovlev, S., Solterbeck, C.H. and Piorra, A.: Self-poled Pb(Zr,Ti)O3 films with improved pyroelectric properties via the use of (La0.8Sr0.2)MnO3/metal substrate heterostructures. Appl. Phys. Lett. 86, 022907 (2005).Google Scholar
4.Basit, N.A., Kim, H.K. and Blachere, J.: Growth of highly oriented Pb(Zr,Ti)O3 films on MgO-buffered oxidized Si substrates and its application to ferroelectric nonvolatile memory field-effect transistors. Appl. Phys. Lett. 73, 3941 (1998).CrossRefGoogle Scholar
5.Brewer, R.T., Atwater, H.A., Groves, J.R. and Arendt, P.N.: Reflection high-energy electron diffraction experimental analysis of polycrystalline MgO films with grain size and orientation distributions. J. App. Phys. 93, 205 (2003).Google Scholar
6.Yu, L.S., Harper, J.M.E., Cuomo, J.J. and Smith, D.: Alignment of thin films by glancing angle ion bombardment during deposition. Appl. Phys. Lett. 47, 932 (1985).CrossRefGoogle Scholar
7.Iijima, Y., Tanabe, N., Kohno, O. and Ikeno, Y.: In-plane aligned Yba2Cu3O7−x thin films deposited on polycrystalline metallic substrates. Appl. Phys. Lett. 60, 769 (1992).Google Scholar
8.Reade, R.P., Berdahl, P., Russo, R.E. and Garrison, S.M.: Laser deposition of biaxially textured yttria-stabilized zirconia buffer layers on polycrystalline metallic alloys for high critical current Y-Ba-Cu-O thin films. App. Phys. Lett. 61, 2231 (1992).Google Scholar
9.Chudzik, M.P., Erck, R., Lanagan, M.T. and Kannewurf, C.R.: Processing dependence of biaxial texture in ytrria stabilized zirconia by ion-beam-assisted deposition. IEEE Trans. Appl. Supercon. 9, 1490 (1999).Google Scholar
10.Wu, X.D., Foltyn, S.R., Arendt, P.N., Townsend, J., Adams, C., Campbell, I.H., Tiwari, P., Coulter, Y. and Peterson, J.E.: High current YBa2Cu3O7−δ thick films on flexible nickel substrates with textured buffer layers. Appl. Phys. Lett. 65, 1961 (1994).Google Scholar
11.Huhne, R., Beyer, C., Holzapfel, B., Oertel, C.G., Schultz, L. and Skrotzki, W.: Formation and destruction of cube texture in MgO films using ion beam assisted pulsed laser deposition. J. Appl. Phys. 90, 1035 (2001).CrossRefGoogle Scholar
12.Foltyn, S.R., Arendt, P.N., Jia, Q.X., Wang, H., MacManus-Discoll, J.L., Kreiskott, S., De Paula, R.F., Stan, L., Groves, J.R. and Dowden, P.C.: Strongly coupled critical current density values achieved in Y1Ba2Cu3O7−δ coated conductors with near-single-crytsal texture. Appl. Phys. Lett. 82, 4519 (2003).Google Scholar
13.Wang, C.P., Do, K.B., Beasely, M.R., Geballe, T.H. and Hammond, R.H.: Deposition of in-plane textured MgO on amorphous Si3N4 substrates by ion-beam-assisted deposition and comparisons with ion-beam-assisted yttria-stabilized-zirconia. Appl. Phys. Lett. 71, 2955 (1997).CrossRefGoogle Scholar
14.Brewer, R.T. and Atwater, H.A.: Rapid biaxial texture development during nucleation of MgO thin films during ion-beam-assisted deposition. Appl. Phys. Lett. 80, 3388 (2002).Google Scholar
15.Groves, J.R., Arendt, P.N., Kung, H., Foltyn, S.R., DePaula, R.F., Emmert, L.K. and Storer, J.G.: Texture development in IBAD MgO films as a function of deposition thickness and rate. IEEE Trans. Appl. Supercon. 11, 2822 (2001).Google Scholar
16.Findikoglu, A.T., Kreiskott, S., Riele, P.M. te and Matias, V.: Role of beam divergence and ion-to-molecule flux ratio in ion-beam-assisted deposition texturing of MgO. J. Mater. Res. 19, 501 (2004).Google Scholar
17.Groves, J.R., Arendt, P.N., Jia, Q.X., Foltyn, S.R., De Paula, R.F., Dowden, P.C., Kinder, L.R., Fan, Y. and Peterson, E.J.: High critical current density PLD YBCO deposited on highly textured IBAD MgO buffer layers. Ceram. Trans. 104, 219 (2000).Google Scholar
18.Wang, C.P. Ion beam modification of oxide thin film texture and its applications. Ph.D. Thesis, Stanford University, Stanford, CA, (1999), p. 17.Google Scholar